TO

Takehiko Orii

TL Tokyo Electron Limited: 62 patents #35 of 5,567Top 1%
IW Iwatani: 2 patents #13 of 73Top 20%
KT Kabushiki Kaisha Toshiba: 2 patents #9,982 of 21,451Top 50%
Toshiba Memory: 2 patents #853 of 1,971Top 45%
Overall (All Time): #36,794 of 4,157,543Top 1%
62
Patents All Time

Issued Patents All Time

Showing 1–25 of 62 patents

Patent #TitleCo-InventorsDate
12172198 Gas cluster processing device and gas cluster processing method Kazuya Dobashi, Yukimasa Saito, Kunihiko Koike, Takehiko Senoo, Koichi Izumi +3 more 2024-12-24
11594417 Etching method and apparatus Kazuhito Miyata, Nobuhiro Takahashi, Shunta Furutani, Shoi SUZUKI 2023-02-28
11581192 Etching method and etching apparatus Nobuhiro Takahashi 2023-02-14
11367630 Substrate cleaning method, substrate cleaning system, and memory medium Miyako Kaneko, Keiji Tanouchi, Itaru Kanno, Meitoku Aibara, Satoru Tanaka 2022-06-21
11267021 Gas cluster processing device and gas cluster processing method Kazuya Dobashi, Yukimasa Saito, Kunihiko Koike, Takehiko Senoo, Koichi Izumi +3 more 2022-03-08
11189498 Method of etching silicon-containing film, computer-readable storage medium, and apparatus for etching silicon-containing film Yasuo ASADA, Jun LIN, Ayano HAGIWARA, Shinji Irie, Kenji Tanouchi +1 more 2021-11-30
11011383 Etching method Yasuo ASADA, Nobuhiro Takahashi 2021-05-18
10998183 Substrate cleaning apparatus, substrate cleaning system, substrate cleaning method and memory medium Miyako Kaneko, Satoru Shimura, Masami Yamashita, Itaru Kanno 2021-05-04
10835908 Substrate processing method Miyako Kaneko, Itaru Kanno 2020-11-17
10811283 Substrate cleaning method, substrate cleaning system, and memory medium Miyako Kaneko, Keiji Tanouchi, Itaru Kanno, Meitoku Aibara, Satoru Tanaka 2020-10-20
10734243 Etching method and substrate processing system Tsuhung Huang, Jun LIN 2020-08-04
10665470 Etching method and etching apparatus Yasuo ASADA, Shinji Irie, Nobuhiro Takahashi, Ayano HAGIWARA, Tatsuya Yamaguchi 2020-05-26
10207349 High-pressure container, substrate processing apparatus, and method for manufacturing high-pressure container Kazuyuki Mitsuoka, Gen You, Hiroki Ohno, Takayuki Toshima, Hiroaki Inadomi 2019-02-19
10199240 Substrate processing method, substrate processing apparatus, and storage medium Hidekazu Hayashi, Yohei Sato, Hisashi Okuchi, Hiroshi Tomita, Kazuyuki Mitsuoka +4 more 2019-02-05
10115609 Separation and regeneration apparatus and substrate processing apparatus Kazuyuki Mitsuoka, Hiroki Ohno, Takayuki Toshima 2018-10-30
10096462 Substrate processing method and storage medium Hidekazu Hayashi, Yohei Sato, Hisashi Okuchi, Hiroshi Tomita, Kazuyuki Mitsuoka +3 more 2018-10-09
10046370 Substrate processing apparatus, substrate processing method, fluid supplying method and storage medium Gentaro Goshi, Kazuyuki Mitsuoka, Gen You, Hiroki Ohno, Takayuki Toshima 2018-08-14
10043652 Substrate cleaning method, substrate cleaning system, and memory medium Miyako Kaneko, Keiji Tanouchi, Itaru Kanno 2018-08-07
9953826 Substrate cleaning method, substrate cleaning system, and memory medium Miyako Kaneko, Keiji Tanouchi, Itaru Kanno, Meitoku Aibara, Satoru Tanaka 2018-04-24
9922849 Substrate liquid processing apparatus having nozzle with multiple flow paths and substrate liquid processing method thereof Yasuyuki Ido, Naoki Shindo, Keisuke Egashira, Yosuke Hachiya, Kotaro Ooishi +2 more 2018-03-20
9881784 Substrate processing method, substrate processing apparatus, and storage medium Hiroki Ohno, Keiji Tanouchi, Kazuyuki Mitsuoka, Takayuki Toshima 2018-01-30
9799538 Substrate cleaning system Miyako Kaneko, Itaru Kanno 2017-10-24
9662685 Substrate processing apparatus, substrate processing method, fluid supplying method and storage medium Gentaro Goshi, Kazuyuki Mitsuoka, Gen You, Hiroki Ohno, Takayuki Toshima 2017-05-30
9583330 Supercritical drying method for semiconductor substrate and supercritical drying apparatus Linan Ji, Hidekazu Hayashi, Hiroshi Tomita, Hisashi Okuchi, Yohei Sato +5 more 2017-02-28
9443712 Substrate cleaning method and substrate cleaning system Miyako Kaneko, Itaru Kanno 2016-09-13