KT

Keiji Tanouchi

TL Tokyo Electron Limited: 12 patents #586 of 5,567Top 15%
Overall (All Time): #410,027 of 4,157,543Top 10%
12
Patents All Time

Issued Patents All Time

Showing 1–12 of 12 patents

Patent #TitleCo-InventorsDate
11367630 Substrate cleaning method, substrate cleaning system, and memory medium Miyako Kaneko, Takehiko Orii, Itaru Kanno, Meitoku Aibara, Satoru Tanaka 2022-06-21
10811283 Substrate cleaning method, substrate cleaning system, and memory medium Miyako Kaneko, Takehiko Orii, Itaru Kanno, Meitoku Aibara, Satoru Tanaka 2020-10-20
10121659 Pattern forming method and heating apparatus Makoto Muramatsu, Takahiro Kitano, Tadatoshi Tomita 2018-11-06
10043652 Substrate cleaning method, substrate cleaning system, and memory medium Miyako Kaneko, Takehiko Orii, Itaru Kanno 2018-08-07
9953826 Substrate cleaning method, substrate cleaning system, and memory medium Miyako Kaneko, Takehiko Orii, Itaru Kanno, Meitoku Aibara, Satoru Tanaka 2018-04-24
9881784 Substrate processing method, substrate processing apparatus, and storage medium Hiroki Ohno, Kazuyuki Mitsuoka, Takehiko Orii, Takayuki Toshima 2018-01-30
9859118 Pattern forming method and heating apparatus Makoto Muramatsu, Takahiro Kitano, Tadatoshi Tomita 2018-01-02
9748101 Substrate treatment method, computer storage medium, and substrate treatment system Makoto Muramatsu, Takahiro Kitano, Tadatoshi Tomita, Soichiro Okada 2017-08-29
9618849 Pattern forming method, pattern forming apparatus, and computer readable storage medium Makoto Muramatsu, Takahiro Kitano, Tadatoshi Tomita 2017-04-11
9530645 Pattern forming method, pattern forming apparatus, and non-transitory computer-readable storage medium Makoto Muramatsu, Takahiro Kitano, Tadatoshi Tomita 2016-12-27
7976896 Method of processing a substrate and apparatus processing the same Yoshiteru Fukuda, Nobuhiro Ogata, Takayuki Ishii 2011-07-12
7781342 Substrate treatment method for etching a base film using a resist pattern Mitsuaki Iwashita, Satoru Shimura 2010-08-24