IK

Itaru Kanno

TL Tokyo Electron Limited: 17 patents #362 of 5,567Top 7%
Mitsubishi Electric: 14 patents #1,823 of 25,717Top 8%
RT Renesas Technology: 4 patents #758 of 3,337Top 25%
RE Ryoden Semiconductor System Engineering: 3 patents #32 of 195Top 20%
RE Renesas Electronics: 3 patents #1,322 of 4,529Top 30%
JS Jsr: 1 patents #649 of 1,137Top 60%
SC Sumitomo Chemical: 1 patents #2,469 of 4,033Top 65%
Sumitomo Electric Industries: 1 patents #13,249 of 21,551Top 65%
TC Taiyo Sanso Co.: 1 patents #9 of 23Top 40%
TC Taiyo Toyo Sanso Co.: 1 patents #6 of 10Top 60%
KA Kao: 1 patents #1,961 of 3,221Top 65%
Overall (All Time): #82,587 of 4,157,543Top 2%
39
Patents All Time

Issued Patents All Time

Showing 1–25 of 39 patents

Patent #TitleCo-InventorsDate
11367630 Substrate cleaning method, substrate cleaning system, and memory medium Miyako Kaneko, Keiji Tanouchi, Takehiko Orii, Meitoku Aibara, Satoru Tanaka 2022-06-21
11201050 Substrate processing method, recording medium and substrate processing apparatus Hiromi Kiyose, Gentaro Goshi, Naohiko Hamamura, Takuro Masuzumi, Kenji Sekiguchi +2 more 2021-12-14
10998183 Substrate cleaning apparatus, substrate cleaning system, substrate cleaning method and memory medium Miyako Kaneko, Takehiko Orii, Satoru Shimura, Masami Yamashita 2021-05-04
10835908 Substrate processing method Miyako Kaneko, Takehiko Orii 2020-11-17
10811283 Substrate cleaning method, substrate cleaning system, and memory medium Miyako Kaneko, Keiji Tanouchi, Takehiko Orii, Meitoku Aibara, Satoru Tanaka 2020-10-20
10792711 Substrate processing system, substrate cleaning method, and recording medium Meitoku Aibara, Yuki Yoshida, Hisashi Kawano, Masami Yamashita, Kenji Mochida +1 more 2020-10-06
10734255 Substrate cleaning method, substrate cleaning system and memory medium Kenji Sekiguchi, Meitoku Aibara, Kouzou Tachibana 2020-08-04
10272478 Substrate processing system, substrate cleaning method, and recording medium Meitoku Aibara, Yuki Yoshida, Hisashi Kawano, Masami Yamashita, Kenji Mochida +1 more 2019-04-30
10242889 Substrate liquid processing method and substrate liquid processing apparatus Jun Nonaka 2019-03-26
10083845 Substrate processing apparatus, substrate processing method and storage medium 2018-09-25
10043652 Substrate cleaning method, substrate cleaning system, and memory medium Miyako Kaneko, Keiji Tanouchi, Takehiko Orii 2018-08-07
9953826 Substrate cleaning method, substrate cleaning system, and memory medium Miyako Kaneko, Keiji Tanouchi, Takehiko Orii, Meitoku Aibara, Satoru Tanaka 2018-04-24
9818598 Substrate cleaning method and recording medium Meitoku Aibara, Yuki Yoshida, Hisashi Kawano, Masami Yamashita, Kenji Mochida +1 more 2017-11-14
9799538 Substrate cleaning system Miyako Kaneko, Takehiko Orii 2017-10-24
9443712 Substrate cleaning method and substrate cleaning system Miyako Kaneko, Takehiko Orii 2016-09-13
9378940 Substrate processing apparatus and substrate processing method Hisashi Kawano, Norihiro Ito, Yosuke Hachiya, Jun Nogami, Kotaro Ooishi 2016-06-28
9362184 Semiconductor device, manufacturing method of semiconductor device, semiconductor manufacturing and inspecting apparatus, and inspecting apparatus Takahiko Kato, Hiroshi Nakano, Haruo Akahoshi, Yuuji Takada, Yoshimi Sudo +3 more 2016-06-07
8946895 Semiconductor device, manufacturing method of semiconductor device, semiconductor manufacturing and inspecting apparatus, and inspecting apparatus Takahiko Kato, Hiroshi Nakano, Haruo Akahoshi, Yuuji Takada, Yoshimi Sudo +3 more 2015-02-03
8569136 Manufacturing method of semiconductor device 2013-10-29
8037891 Two-fluid nozzle for cleaning substrate and substrate cleaning apparatus Yusaku Hirota, Kenji Sekiguchi, Hiroshi Nagayasu, Shouichi Shimose 2011-10-18
7537987 Semiconductor device manufacturing method Masahiko Higashi, Satoshi Kume, Jiro Yugami, Shinichi Yamanari, Takahiro Maruyama 2009-05-26
7250391 Cleaning composition for removing resists and method of manufacturing semiconductor device Yasuhiro Asaoka, Masahiko Higashi, Yoshiharu Hidaka, Etsuro Kishio, Tetsuo Aoyama +3 more 2007-07-31
6730239 Cleaning agent for semiconductor device & method of fabricating semiconductor device Naoki Yokoi, Hiroshi Morita, Naoki Ichiki, Hideaki Nezu, Masayuki Takashima 2004-05-04
6713232 Method of manufacturing semiconductor device with improved removal of resist residues Seiji Muranaka, Mami Shirota, Junji Kondo 2004-03-30
6708903 Two-fluid cleaning jet nozzle, cleaning equipment and method of fabricating semiconductor device employing the same 2004-03-23