Issued Patents All Time
Showing 1–25 of 33 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8545716 | Etching liquid composition | Tsuguhiro Tago, Tomotake Matsuda, Mayumi Kimura | 2013-10-01 |
| 7399365 | Aqueous fluoride compositions for cleaning semiconductor devices | Toshitaka Hiraga, Tomoko Suzuki | 2008-07-15 |
| 7341827 | Separation-material composition for photo-resist and manufacturing method of semiconductor device | Masafumi Muramatsu, Hayato Iwamoto, Kazumi Asada, Tomoko Suzuki, Toshitaka Hiraga | 2008-03-11 |
| 7250391 | Cleaning composition for removing resists and method of manufacturing semiconductor device | Itaru Kanno, Yasuhiro Asaoka, Masahiko Higashi, Yoshiharu Hidaka, Etsuro Kishio +3 more | 2007-07-31 |
| 6875288 | Cleaning agent and cleaning method | Hideto Gotoh, Takayuki Niuya, Hiroyuki Mori, Hiroshi Matsunaga, Fukusaburo Ishihara +4 more | 2005-04-05 |
| 6686322 | Cleaning agent and cleaning process using the same | Masahiro Nohara, Ryou Hashimoto, Taimi Oketani, Hisaki Abe, Taketo Maruyama | 2004-02-03 |
| 6638694 | Resist stripping agent and process of producing semiconductor devices using the same | Kazuto Ikemoto, Hisaki Abe, Taketo Maruyama | 2003-10-28 |
| 6514352 | Cleaning method using an oxidizing agent, chelating agent and fluorine compound | Hideto Gotoh, Takayuki Niuya, Hiroyuki Mori, Hiroshi Matsunaga, Fukusaburo Ishihara +4 more | 2003-02-04 |
| 6500270 | Resist film removing composition and method for manufacturing thin film circuit element using the composition | Masahiro Nohara, Yukihiko Takeuchi, Taimi Oketani, Taketo Maruyama, Tetsuya Karita +1 more | 2002-12-31 |
| 6462005 | Cleaning agent for a semiconductor device and a method of manufacturing a semiconductor device | Hideto Gotoh, Rieko Nakano, Hideki Fukuda | 2002-10-08 |
| 6458517 | Photoresist stripping composition and process for stripping photoresist | Masahiro Nohara, Yukihiko Takeuchi, Hisaki Abe, Taketo Maruyama | 2002-10-01 |
| 6440326 | Photoresist removing composition | Taketo Maruyama, Hisaki Abe, Tetsuya Karita | 2002-08-27 |
| 6372410 | Resist stripping composition | Kazuto Ikemoto, Kojiro Abe | 2002-04-16 |
| 6265309 | Cleaning agent for use in producing semiconductor devices and process for producing semiconductor devices using the same | Hideto Gotoh, Tsuyoshi Matsui, Takayuki Niuya, Taketo Maruyama, Tetsuya Karita +3 more | 2001-07-24 |
| 6199567 | Method and apparatus for manufacturing semiconductor device | Itaru Kanno, Mayumi Hada | 2001-03-13 |
| 5972862 | Cleaning liquid for semiconductor devices | Yoshimi Torii, Shunji Sasabe, Masayuki Kojima, Kazuhisa Usuami, Takafumi Tokunaga +8 more | 1999-10-26 |
| 5962385 | Cleaning liquid for semiconductor devices | Taketo Maruyama, Ryuji Hasemi, Hidetoshi Ikeda | 1999-10-05 |
| 5911836 | Method of producing semiconductor device and rinse for cleaning semiconductor device | Mayumi Hada, Ryuji Hasemi, Hidetoshi Ikeda | 1999-06-15 |
| 5846695 | Removing agent composition for a photoresist and process for producing a semiconductor integrated circuit | Keiichi Iwata, Tetsuya Karita | 1998-12-08 |
| 5693599 | Flux washing agent | Toshio Kondoh, Toshihiko Kobayashi, Kaoru Tsuyuki | 1997-12-02 |
| 5630904 | Stripping and cleaning agent for removing dry-etching and photoresist residues from a semiconductor substrate, and a method for forming a line pattern using the stripping and cleaning agent | Rieko Nakano, Akira Ishihama, Koichiro Adachi | 1997-05-20 |
| 5538832 | Developing solution for producing printed circuit boards and a process for producing printed circuit boards wherein the developing solution comprises a quaternary ammonium hydroxide and a quaternary ammonium carbonate | Takeshi Nagasaka, Toshihiko Kobayashi, Naohito Yoshimura, Takashi Nakata, Youichi Takizawa | 1996-07-23 |
| 5393386 | Method for preparing aqueous quaternary ammonium hydroxide solution | Toshio Kondo, Yasushi Sugawara, Masahiro Miyake | 1995-02-28 |
| 5338462 | Active carbon materials, process for the preparation thereof and the use thereof | Hisaki Abe, Toshio Kondoh, Hideki Fukuda, Mayumi Takahashi, Masahiro Miyake | 1994-08-16 |
| 5242879 | Active carbon materials, process for the preparation thereof and the use thereof | Hisaki Abe, Toshio Kondoh, Hideki Fukuda, Mayumi Takahashi, Masahiro Miyake | 1993-09-07 |