Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11261194 | Production method of diol | Hideyuki Sato | 2022-03-01 |
| 10975191 | Urethane (meth)acrylate, method for manufacturing urethane (meth)acrylate, curable composition, cured article, and method for manufacturing cured article | Taketo Ikeno, Umi Yokobori, Hideyuki Sato | 2021-04-13 |
| 10294319 | Triacrylate compounds and methods for producing the same, and compositions | Umi Yokobori, Taketo Ikeno, Hideyuki Sato | 2019-05-21 |
| 8835595 | Polyamide compound | Takafumi Oda, Ryoji Otaki, Shota Arakawa, Tsuneaki Masuda, Hiroyuki Matsushita | 2014-09-16 |
| 7470525 | Process for producing optically active 2-alkycysteine, derivative thereof, and processes for production | Yasushi Higuchi, Akinori Tanaka, Masaki Sugita | 2008-12-30 |
| 7208631 | 2-alkylcysteinamide or salt thereof, process for producing these, and use of these | Yasushi Higuchi, Akinori Tanaka | 2007-04-24 |
| 6447576 | Cleaning agent and cleaning process of harmful gas | Kenji Otsuka, Yutaka Amijima, Youji Nawa | 2002-09-10 |
| 6325841 | Purifying agent and purification method for halogen-containing exhaust gas | Kenji Otsuka, Satoshi Arakawa, Yutaka Amijima, Norihiro Suzuki | 2001-12-04 |
| 5972862 | Cleaning liquid for semiconductor devices | Yoshimi Torii, Shunji Sasabe, Masayuki Kojima, Kazuhisa Usuami, Takafumi Tokunaga +8 more | 1999-10-26 |
| 5962385 | Cleaning liquid for semiconductor devices | Taketo Maruyama, Hidetoshi Ikeda, Tetsuo Aoyama | 1999-10-05 |
| 5911836 | Method of producing semiconductor device and rinse for cleaning semiconductor device | Mayumi Hada, Hidetoshi Ikeda, Tetsuo Aoyama | 1999-06-15 |
| 5567574 | Removing agent composition for photoresist and method of removing | Keiichi Iwata, Mayumi Hada, Hidetoshi Ikeda | 1996-10-22 |
| 5436364 | Process for producing dimethyl 2,6-naphthalene-dicarboxylate | Seiji Uchiyama, Hiroshi Machida, Rieko Nakano | 1995-07-25 |