YH

Yasushi Higuchi

MC Mitsubishi Gas Chemical Company: 11 patents #164 of 1,727Top 10%
DE Denso: 9 patents #1,418 of 11,792Top 15%
NC Nippondenso Co.: 8 patents #238 of 3,479Top 7%
IC Ihara Chemical Industry Co.: 6 patents #45 of 263Top 20%
NG Nihon Shinku Gijutsu: 6 patents #6 of 128Top 5%
FL Flosfia: 4 patents #12 of 45Top 30%
UL Ulvac: 4 patents #97 of 680Top 15%
Overall (All Time): #57,611 of 4,157,543Top 2%
48
Patents All Time

Issued Patents All Time

Showing 1–25 of 48 patents

Patent #TitleCo-InventorsDate
12289917 Semiconductor device Mitsuru Okigawa, Fujio Okui, Koji AMAZUTSUMI, Hidetaka Shibata, Yuji Kato +1 more 2025-04-29
12284822 Semiconductor device comprising crystalline oxide semiconductor layer and semiconductor system having the same Masahiro Sugimoto 2025-04-22
12159940 Multilayer structure and semiconductor device Mitsuru Okigawa, Yusuke MATSUBARA, Osamu Imafuji, Takashi Shinohe 2024-12-03
12107137 Semiconductor device Mitsuru Okigawa, Fujio Okui, Koji AMAZUTSUMI, Hidetaka Shibata, Yuji Kato +1 more 2024-10-01
10714606 Semiconductor device Youngshin Eum, Kazuhiro Oyama, Yoshinori Tsuchiya, Shinichi Hoshi 2020-07-14
10403745 Nitride semiconductor device including a horizontal switching device Shinichi Hoshi, Kazuhiro Oyama 2019-09-03
10109727 Semiconductor device Kazuhiro Oyama, Seigo Oosawa, Masaki Matsui, Youngshin Eum 2018-10-23
10062747 Semiconductor device Youngshin Eum, Kazuhiro Oyama, Shinichi Hoshi 2018-08-28
9231090 Trench-gate-type insulated gate bipolar transistor Masakiyo Sumitomo 2016-01-05
9216609 Radical etching apparatus and method Hiroaki Inoue, Michio Ishikawa 2015-12-22
9178050 Load-short-circuit-tolerant semiconductor device having trench gates Shigemitsu Fukatsu, Masakiyo Sumitomo 2015-11-03
8883632 Manufacturing method and manufacturing apparatus of device Youhei Endo, Shuji Kodaira, Yuta SAKAMOTO, Junichi Hamaguchi, Yohei Uchida +4 more 2014-11-11
8815737 Method for forming NiSi film, method for forming silicide film, method for forming metal film for use in silicide-annealing, apparatus for vacuum processing and film-forming apparatus Toshimitsu Uehigashi, Kazuhiro Sonoda, Harunori Ushikawa, Naoki Hanada 2014-08-26
8669191 Method for forming Ni film Toshimitsu Uehigashi, Michio Ishikawa, Harunori Ushikawa, Naoki Hanada 2014-03-11
8659065 Semiconductor device and method of manufacturing the same Masakiyo Sumitomo, Shigemitsu Fukatsu 2014-02-25
8022477 Semiconductor apparatus having lateral type MIS transistor Nozomu Akagi, Shigeki Takahashi, Takashi Nakano, Tetsuo Fujii, Yoshiyuki Hattori +1 more 2011-09-20
7893458 Semiconductor device having lateral MOS transistor and zener diode Shigeki Takahashi, Takashi Nakano, Nozomu Akagi, Tetsuo Fujii, Yoshiyuki Hattori +2 more 2011-02-22
7470525 Process for producing optically active 2-alkycysteine, derivative thereof, and processes for production Akinori Tanaka, Ryuji Hasemi, Masaki Sugita 2008-12-30
7208631 2-alkylcysteinamide or salt thereof, process for producing these, and use of these Akinori Tanaka, Ryuji Hasemi 2007-04-24
6967258 Production of quaternary ammonium salt of hydroxycarboxylic acid and quaternary ammonium salt of inorganic acid Yutaka Kanbara, Tomoo Tsujimoto, Genki Nogami 2005-11-22
6784317 Production of quaternary ammonium salt of hydroxycarboxylic acid and quarternary ammonium salt of inorganic acid Yutaka Kanbara, Tomoo Tsujimoto, Genki Nogami 2004-08-31
6413392 Sputtering device Tsuyoshi Sahoda, Toshimitsu Uehigashi, Kuniaki Nakajima, Tomoyasu Kondo 2002-07-02
6337249 Semiconductor device and fabrication process thereof Hiroyuki Yamane, Mitsutaka Katada, Noriyuki Iwamori, Tsutomu Kawaguchi, Takeshi Kuzuhara 2002-01-08
6290826 Composite sputtering cathode assembly and sputtering apparatus with such composite sputtering cathode assembly Hisaharu Obinata, Morohisa Tamura, Takashi Komatsu 2001-09-18
6217730 Sputtering device Kuniaki Nakajima, Tomoyasu Kondo, Tsuyoshi Sahoda, Takashi Komatsu 2001-04-17