| 8796142 |
Method for forming tantalum nitride film |
Narishi Gonohe, Satoru Toyoda, Harunori Ushikawa, Kyuzo Nakamura |
2014-08-05 |
| 8470145 |
Cathode unit and sputtering apparatus provided with the same |
Naoki Morimoto, Daisuke Mori, Kyuzo Nakamura |
2013-06-25 |
| 8377269 |
Sputtering apparatus |
Naoki Morimoto, Hideto Nagashima, Daisuke Mori, Akifumi Sano |
2013-02-19 |
| 8158198 |
Method for forming tantalum nitride film |
Narishi Gonohe, Satoru Toyoda, Harunori Ushikawa, Kyuzo Nakamura |
2012-04-17 |
| 8158197 |
Method for forming tantalum nitride film |
Narishi Gonohe, Satoru Toyoda, Harunori Ushikawa, Kyuzo Nakamura |
2012-04-17 |
| 8105468 |
Method for forming tantalum nitride film |
Narishi Gonohe, Satoru Toyoda, Harunori Ushikawa, Kyuzo Nakamura |
2012-01-31 |
| 6706155 |
Sputtering apparatus and film manufacturing method |
Naoki Morimoto, Hideto Nagashima |
2004-03-16 |
| 6469448 |
Inductively coupled RF plasma source |
Youji Taguchi |
2002-10-22 |
| 6413392 |
Sputtering device |
Tsuyoshi Sahoda, Toshimitsu Uehigashi, Yasushi Higuchi, Kuniaki Nakajima |
2002-07-02 |
| 6217730 |
Sputtering device |
Kuniaki Nakajima, Tsuyoshi Sahoda, Yasushi Higuchi, Takashi Komatsu |
2001-04-17 |