HU

Harunori Ushikawa

TL Tokyo Electron Limited: 11 patents #663 of 5,567Top 15%
UL Ulvac: 9 patents #20 of 680Top 3%
SC Shin-Etsu Chemical Co.: 1 patents #1,340 of 2,176Top 65%
📍 Kofu, JP: #17 of 209 inventorsTop 9%
Overall (All Time): #224,353 of 4,157,543Top 6%
20
Patents All Time

Issued Patents All Time

Showing 1–20 of 20 patents

Patent #TitleCo-InventorsDate
8815737 Method for forming NiSi film, method for forming silicide film, method for forming metal film for use in silicide-annealing, apparatus for vacuum processing and film-forming apparatus Yasushi Higuchi, Toshimitsu Uehigashi, Kazuhiro Sonoda, Naoki Hanada 2014-08-26
8809193 Method for the formation of Co film and method for the formation of Cu interconnection film Shoichiro Kumamoto, Satoru Toyoda 2014-08-19
8796142 Method for forming tantalum nitride film Narishi Gonohe, Satoru Toyoda, Tomoyasu Kondo, Kyuzo Nakamura 2014-08-05
8669191 Method for forming Ni film Toshimitsu Uehigashi, Yasushi Higuchi, Michio Ishikawa, Naoki Hanada 2014-03-11
8476161 Method for forming Cu electrical interconnection film Shoichiro Kumamoto, Masamichi Harada 2013-07-02
8377207 Purge gas assembly Tsuyoshi Kagami, Osamu Irino, Nobuyuki Kato 2013-02-19
8158197 Method for forming tantalum nitride film Narishi Gonohe, Satoru Toyoda, Tomoyasu Kondo, Kyuzo Nakamura 2012-04-17
8158198 Method for forming tantalum nitride film Narishi Gonohe, Satoru Toyoda, Tomoyasu Kondo, Kyuzo Nakamura 2012-04-17
8105468 Method for forming tantalum nitride film Narishi Gonohe, Satoru Toyoda, Tomoyasu Kondo, Kyuzo Nakamura 2012-01-31
6551896 Capacitor for analog circuit, and manufacturing method thereof Keizo Hosoda, Yusuke Muraki, Atsushi Sato 2003-04-22
6140256 Method and device for treating semiconductor with treating gas while substrate is heated 2000-10-31
6007633 Single-substrate-processing apparatus in semiconductor processing system Masayuki Kitamura 1999-12-28
5984607 Transfer apparatus, transfer method, treatment apparatus and treatment method Tetsu Oosawa 1999-11-16
5904872 Heating device, method of manufacturing the same, and processing apparatus using the same Junichi Arami, Kenji Ishikawa, Isao Yanagisawa, Nobuo Kawada, Hiroshi Mogi 1999-05-18
5775889 Heat treatment process for preventing slips in semiconductor wafers Junichi Kobayashi, Eiichiro Takanabe, Tomohisa Shimazu 1998-07-07
5536320 Processing apparatus Kenji Tago 1996-07-16
5378283 Treating device 1995-01-03
5310339 Heat treatment apparatus having a wafer boat 1994-05-10
5225378 Method of forming a phosphorus doped silicon film 1993-07-06
5116784 Method of forming semiconductor film 1992-05-26