TS

Tomohisa Shimazu

TL Tokyo Electron Limited: 20 patents #275 of 5,567Top 5%
Overall (All Time): #225,399 of 4,157,543Top 6%
20
Patents All Time

Issued Patents All Time

Showing 1–20 of 20 patents

Patent #TitleCo-InventorsDate
7479619 Thermal processing unit Takanori Saito, Toshiyuki Makiya, Hisaei Osanai, Tsuyoshi Takizawa, Kazuhide Hasebe +3 more 2009-01-20
7144823 Thermal treatment apparatus Takanori Saito, Toshiyuki Makiya, Hisaei Osanai, Tsuyoshi Takizawa, Kazuhide Hasebe +3 more 2006-12-05
6283175 Enveloping device and vertical heat-treating apparatus for semiconductor process system 2001-09-04
6235121 Vertical thermal treatment apparatus Manabu Honma 2001-05-22
6142773 Enveloping device and vertical heat-treating apparatus for semiconductor process system 2000-11-07
6062853 Heat-treating boat for semiconductor wafers Ken Nakao 2000-05-16
D423026 Quartz cover 2000-04-18
6030457 Substrate processing apparatus Kenji Honma, Makoto Nakamura 2000-02-29
6031205 Thermal treatment apparatus with thermal protection members intercepting thermal radiation at or above a predetermined angle 2000-02-29
D411176 Wafer boat for use in a semiconductor wafer heat processing apparatus 1999-06-22
D409158 Wafer boat for use in a semiconductor wafer heat processing apparatus 1999-05-04
D407696 Inner tube for use in a semiconductor wafer heat processing apparatus 1999-04-06
D405431 Tube for use in a semiconductor wafer heat processing apparatus 1999-02-09
D405062 Processing tube for use in a semiconductor wafer heat processing apparatus 1999-02-02
D404371 Wafer boat for use in a semiconductor wafer heat processing apparatus 1999-01-19
D404368 Outer tube for use in a semiconductor wafer heat processing apparatus 1999-01-19
D404375 Heat retaining tube base for use in a semiconductor wafer head processing apparatus 1999-01-19
5775889 Heat treatment process for preventing slips in semiconductor wafers Junichi Kobayashi, Eiichiro Takanabe, Harunori Ushikawa 1998-07-07
5718574 Heat treatment apparatus 1998-02-17
5709543 Vertical heat treatment apparatus 1998-01-20