KH

Kazuhide Hasebe

TL Tokyo Electron Limited: 96 patents #8 of 5,567Top 1%
TL Tokyo Electron Tohoku Limited: 2 patents #13 of 103Top 15%
HO Horiba: 1 patents #319 of 604Top 55%
Air Products And Chemicals: 1 patents #1,147 of 1,997Top 60%
TU Tohoku University: 1 patents #615 of 1,680Top 40%
NE Nec: 1 patents #7,889 of 14,502Top 55%
FC Fuji Electric Co.: 1 patents #1,354 of 2,643Top 55%
Overall (All Time): #15,371 of 4,157,543Top 1%
97
Patents All Time

Issued Patents All Time

Showing 1–25 of 97 patents

Patent #TitleCo-InventorsDate
12359308 Film forming method and semiconductor production apparatus Yusuke Suzuki, Tsuyoshi Moriya, Atsushi Endo, Satoshi Tanaka 2025-07-15
12288671 Film deposition apparatus for fine pattern forming Shigeru Nakajima, Jun Ogawa, Hiroki Murakami 2025-04-29
11881379 Film deposition apparatus for fine pattern forming Shigeru Nakajima, Jun Ogawa, Hiroki Murakami 2024-01-23
11404272 Film deposition apparatus for fine pattern forming Shigeru Nakajima, Jun Ogawa, Hiroki Murakami 2022-08-02
11404271 Film deposition apparatus for fine pattern forming Shigeru Nakajima, Jun Ogawa, Hiroki Murakami 2022-08-02
10879066 Mask pattern forming method, fine pattern forming method, and film deposition apparatus Shigeru Nakajima, Jun Ogawa, Hiroki Murakami 2020-12-29
10822714 Method of growing crystal in recess and processing apparatus used therefor Yoichiro CHIBA, Daisuke Suzuki 2020-11-03
10191378 Mask pattern forming method, fine pattern forming method, and film deposition apparatus Shigeru Nakajima, Jun Ogawa, Hiroki Murakami 2019-01-29
10176992 Mask pattern forming method, fine pattern forming method, and film deposition apparatus Shigeru Nakajima, Jun Ogawa, Hiroki Murakami 2019-01-08
10141187 Mask pattern forming method, fine pattern forming method, and film deposition apparatus Shigeru Nakajima, Jun Ogawa, Hiroki Murakami 2018-11-27
9970110 Plasma processing apparatus Jun Ogawa, Akira Shimizu 2018-05-15
9920422 Method and apparatus of forming silicon nitride film Akinobu Kakimoto 2018-03-20
9865457 Nitride film forming method using nitrading active species Akira Shimizu 2018-01-09
9758865 Silicon film forming method, thin film forming method and cross-sectional shape control method Kazuya Takahashi, Katsuhiko Komori, Yoshikazu Furusawa, Mitsuhiro Okada, Hiroyuki Hayashi +1 more 2017-09-12
9613838 Batch-type vertical substrate processing apparatus and substrate holder Mitsuhiro Okada 2017-04-04
9353442 Apparatus for forming silicon-containing thin film Mitsuhiro Okada, Akinobu Kakimoto 2016-05-31
9343292 Stacked semiconductor device, and method and apparatus of manufacturing the same Tomoyuki Obu, Masaki Kurokawa 2016-05-17
9263250 Method and apparatus of forming silicon nitride film Akinobu Kakimoto 2016-02-16
9230799 Method for fabricating semiconductor device and the semiconductor device Akinobu Teramoto, Hiroshi Kambayashi, Hirokazu Ueda, Yuichiro Morozumi, Katsushige Harada +1 more 2016-01-05
9190271 Thin film formation method Akinobu Kakimoto 2015-11-17
9123782 Amorphous silicon film formation method and amorphous silicon film formation apparatus Hiroki Murakami, Akinobu Kakimoto 2015-09-01
9006021 Amorphous silicon film formation method and amorphous silicon film formation apparatus Hiroki Murakami, Akinobu Kakimoto 2015-04-14
9005459 Film deposition method and film deposition apparatus Akinobu Kakimoto, Satoshi Takagi, Toshiyuki Ikeuchi, Katsuhiko Komori 2015-04-14
8946065 Method of forming seed layer and method of forming silicon-containing thin film Mitsuhiro Okada, Akinobu Kakimoto 2015-02-03
8945339 Film formation apparatus Akinobu Kakimoto, Katsuhiko Komori 2015-02-03