HU

Hirokazu Ueda

TL Tokyo Electron Limited: 21 patents #248 of 5,567Top 5%
Micron: 7 patents #1,853 of 6,345Top 30%
HM Howa Machinery: 1 patents #54 of 89Top 65%
KS Kobe Steel: 1 patents #857 of 2,031Top 45%
KC Kanzaki Kokyukoki Mfg. Co.: 1 patents #113 of 208Top 55%
NU National University Corporation Tohoku University: 1 patents #86 of 170Top 55%
Sharp Kabushiki Kaisha: 1 patents #6,861 of 10,731Top 65%
TU Tohoku University: 1 patents #615 of 1,680Top 40%
SO Sony: 1 patents #17,262 of 25,231Top 70%
TI Texas Instruments: 1 patents #7,357 of 12,488Top 60%
FC Fuji Electric Co.: 1 patents #1,354 of 2,643Top 55%
TO Toyota: 1 patents #15,335 of 26,838Top 60%
Fujitsu Limited: 1 patents #14,843 of 24,456Top 65%
Overall (All Time): #91,926 of 4,157,543Top 3%
36
Patents All Time

Issued Patents All Time

Showing 25 most recent of 36 patents

Patent #TitleCo-InventorsDate
12417928 Substrate processing method and substrate processing system Takeo Nakano, Mitsuaki Iwashita, Ryuichi Asako, Naoki UMESHITA 2025-09-16
12406862 Vacuum processing apparatus and oxidizing gas removal method Yoji IIZUKA, Mitsuaki Iwashita, Antonio Luis Pacheco Rotondaro, Dipak Aryal, Takeo Nakano +5 more 2025-09-02
12247768 Electrocaloric effect element, heat transfer device, semiconductor manufacturing device, and electrocaloric effect element control method Koji Akiyama, Hiroyuki Nagai, Mitsuaki Iwashita 2025-03-11
12112921 Plasma processing method and plasma processing apparatus Hiroyuki Ikuta, Yutaka Fujino 2024-10-08
12077865 Film forming method and film forming apparatus Hideki Yuasa, Hiroyuki Ikuta, Yutaka Fujino, Makoto Wada 2024-09-03
12060641 Film forming method and film forming apparatus Hideki Yuasa, Yutaka Fujino, Yoshiyuki Kondo, Hiroyuki Ikuta 2024-08-13
12011738 Substrate processing method and ionic liquid Takeo Nakano, Mitsuaki Iwashita, Naoki UMESHITA, Ryuichi Asako, Kenichi Uki 2024-06-18
11972929 Processing apparatus and film forming method Makoto Wada, Takashi Matsumoto, Masahito Sugiura, Ryota IFUKU 2024-04-30
11842886 Plasma processing method and plasma processing apparatus Taro Ikeda, Eiki KAMATA, Mitsutoshi ASHIDA, Isao Gunji 2023-12-12
11615957 Method for forming boron-based film, formation apparatus Jinwang Li, Masahiro Oka, Yoshimasa Watanabe, Yuuki Yamamoto, Hiroyuki Ikuta 2023-03-28
11145522 Method of forming boron-based film, and film forming apparatus Yoshimasa Watanabe, Masahiro Oka, Yuuki Yamamoto 2021-10-12
10388524 Film forming method, boron film, and film forming apparatus Masahiro Oka, Hiraku Ishikawa, Yoshimasa Watanabe, Syuhei Yonezawa 2019-08-20
10249498 Method for using heated substrates for process chemistry control Peter L. G. Ventzek 2019-04-02
9658106 Plasma processing apparatus and measurement method Yuuki Kobayashi, Kohei Yamashita, Peter L. G. Ventzek 2017-05-23
9472404 Doping method, doping apparatus and method of manufacturing semiconductor device Masahiro Oka, Yasuhiro Sugimoto, Masahiro Horigome, Yuuki Kobayashi 2016-10-18
9230799 Method for fabricating semiconductor device and the semiconductor device Akinobu Teramoto, Hiroshi Kambayashi, Yuichiro Morozumi, Katsushige Harada, Kazuhide Hasebe +1 more 2016-01-05
9165771 Pulsed gas plasma doping method and apparatus Peter L. G. Ventzek, Takenao Nemoto, Yuuki Kobayashi, Masahiro Horigome 2015-10-20
9034774 Film forming method using plasma Kouji Tanaka 2015-05-19
9029249 Plasma doping apparatus and plasma doping method Masahiro Oka, Masahiro Horigome, Yuuki Kobayashi 2015-05-12
8497214 Semiconductor device manufacturing method Toshihisa Nozawa, Takaaki Matsuoka, Akinobu Teramoto, Tadahiro Ohmi 2013-07-30
8486792 Film forming method of silicon oxide film, silicon oxide film, semiconductor device, and manufacturing method of semiconductor device Yoshinobu Tanaka, Yusuke Ohsawa, Toshihisa Nozawa, Takaaki Matsuoka 2013-07-16
7458697 Lamp cooling device and rear projection display apparatus 2008-12-02
7366051 Word line driver circuitry and methods for using the same 2008-04-29
7269091 Word line driver circuitry and methods for using the same 2007-09-11
7268402 Memory cell with trench-isolated transistor including first and second isolation trenches Keiji Jono, Hiroyuki Watanabe 2007-09-11