MS

Masahito Sugiura

TL Tokyo Electron Limited: 18 patents #330 of 5,567Top 6%
IBM: 2 patents #32,839 of 70,183Top 50%
DE Denso: 1 patents #6,940 of 11,792Top 60%
NE Nec: 1 patents #7,889 of 14,502Top 55%
NC Nippondenso Co.: 1 patents #1,765 of 3,479Top 55%
📍 Yamanashi, JP: #179 of 1,957 inventorsTop 10%
Overall (All Time): #217,856 of 4,157,543Top 6%
20
Patents All Time

Issued Patents All Time

Showing 1–20 of 20 patents

Patent #TitleCo-InventorsDate
12018375 Flim forming method of carbon-containing film by microwave plasma Ryota IFUKU, Takashi Matsumoto, Makoto Wada 2024-06-25
12014907 Method and device for forming graphene structure Ryota IFUKU, Takashi Matsumoto 2024-06-18
11972929 Processing apparatus and film forming method Makoto Wada, Takashi Matsumoto, Ryota IFUKU, Hirokazu Ueda 2024-04-30
11302576 Method of making a semiconductor device including a graphene barrier layer between conductive layers Makoto Wada, Takashi Matsumoto, Ryota IFUKU 2022-04-12
10041174 Method for forming carbon nanotubes and carbon nanotube film forming apparatus Takashi Matsumoto, Kenjiro Koizumi, Yusaku Kashiwagi 2018-08-07
9662705 Processing machine and bending method Hidemasa Otsubo, Masafumi Torimoto, Kazuhiro Mitsukawa, Takao Ikeda 2017-05-30
9059178 Method for forming carbon nanotubes and carbon nanotube film forming apparatus Takashi Matsumoto, Kenjiro Koizumi, Yusaku Kashiwagi 2015-06-16
8168539 Method for forming tungsten film at a surface of a processing target material, film-forming apparatus, storage medium and semiconductor device with a tungsten film Yasutaka Mizoguchi, Yasushi Aiba 2012-05-01
7078341 Method of depositing metal layers from metal-carbonyl precursors Hideaki Yamasaki, Tsukasa Matsuda, Atsushi Gomi, Tatsuo Hatano, Yumiko Kawano +3 more 2006-07-18
7037560 Film forming method, and film modifying method Hiroshi Shinriki 2006-05-02
7030028 Etching method Takuya Mori, Koichiro Inazawa, Noriyuki Kobayashi, Yoshihiro Hayashi, Keizo Kinoshita 2006-04-18
6989321 Low-pressure deposition of metal layers from metal-carbonyl precursors Hideaki Yamasaki, Tsukasa Matsuda, Atsushi Gomi, Tatsuo Hatano, Yumiko Kawano +3 more 2006-01-24
6890848 Fabrication process of a semiconductor device Kaoru Maekawa, Satohiko Hoshino, Federica Allegretti 2005-05-10
6800546 Film forming method by radiating a plasma on a surface of a low dielectric constant film Nobuo Konishi, Mitsuaki Iwashita, Hiroki Ohno, Shigeru Kawamura 2004-10-05
6467491 Processing apparatus and processing method Hiroshi Shinriki, Hideki Kiryu, Shintaro Aoyama 2002-10-22
6428850 Single-substrate-processing CVD method of forming film containing metal element Hiroshi Shinriki, Yijun Liu 2002-08-06
6232248 Single-substrate-heat-processing method for performing reformation and crystallization Hiroshi Shinriki 2001-05-15
6143081 Film forming apparatus and method, and film modifying apparatus and method Hiroshi Shinriki 2000-11-07
6126753 Single-substrate-processing CVD apparatus and method Hiroshi Shinriki, Yijun Liu 2000-10-03
5755963 Filter element and fabrication method for the same Toshihiko MURASE, Yoshihisa Sanami, Toshihiro Takahara, Atushi Kosaka, Takeharu Maekawa +1 more 1998-05-26