Issued Patents All Time
Showing 1–25 of 46 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12227843 | Film forming method and tungsten film | Takuya KAWAGUCHI, Takanobu HOTTA | 2025-02-18 |
| 12221693 | Stress reducing method | Takuya KAWAGUCHI, Takanobu HOTTA | 2025-02-11 |
| 12188125 | Showerhead and substrate processing apparatus | Takanobu HOTTA, Takuya KAWAGUCHI, Toshio Takagi, Takashi Kakegawa | 2025-01-07 |
| 11984319 | Substrate processing method and film forming system | Kensaku Narushima, Nagayasu Hiramatsu, Takanobu HOTTA, Atsushi Matsumoto, Masato Araki | 2024-05-14 |
| 11718910 | Pre-coating method and film forming method | Takeshi ITATANI | 2023-08-08 |
| 11414742 | Substrate processing apparatus, substrate processing method, and storage medium | Tomonari Urano | 2022-08-16 |
| 11150142 | Thermocouple-fixing jig | Takashi Mochizuki, Takeshi ITATANI | 2021-10-19 |
| 11069512 | Film forming apparatus and gas injection member used therefor | Shinya Okabe, Takashi Mochizuki, Nagayasu Hiramatsu, Kazuki DEMPOH | 2021-07-20 |
| 10968514 | Substrate mounting table | Kohichi Satoh, Motoko NAKAGOMI, Junya Oka | 2021-04-06 |
| 10903086 | Titanium silicide region forming method | Kensaku Tanaka, Yuji Kobayashi | 2021-01-26 |
| 10738374 | Method of performing a surface treatment on a mounting table, the mounting table and a plasma processing apparatus | Shinya Okabe, Junya Oka, Yuuji Kobayashi, Takamichi Kikuchi | 2020-08-11 |
| 10731248 | Vacuum processing apparatus and operation method thereof | Shinya Okabe, Takeshi ITATANI | 2020-08-04 |
| 10546753 | Method of removing silicon oxide film | Takamichi Kikuchi, Seishi Murakami | 2020-01-28 |
| 10519542 | Purging method | Takeshi ITATANI | 2019-12-31 |
| 9330936 | Method for depositing metal layers on germanium-containing films using metal chloride precursors | Toshio Hasegawa | 2016-05-03 |
| 9257278 | Method for forming TiN and storage medium | Takeshi Yamamoto | 2016-02-09 |
| 9133548 | TiN film forming method and storage medium | Shinya Okabe, Takeshi Yamamoto, Toru Onishi | 2015-09-15 |
| 8785310 | Method of forming conformal metal silicide films | Toshio Hasegawa, Kunihiro Tada, David L. O'Meara, Gerrit J. Leusink | 2014-07-22 |
| 8389053 | Method of cleaning powdery source supply system, storage medium, substrate processing system and substrate processing method | Tsuyoshi Moriya, Toshio Hasegawa | 2013-03-05 |
| 8029621 | Raw material feeding device, film formation system and method for feeding gaseous raw material | Yumiko Kawano | 2011-10-04 |
| 7960278 | Method of film deposition | Yumiko Kawano | 2011-06-14 |
| 7879399 | CV method using metal carbonyl gas | Tatsuo Hatano | 2011-02-01 |
| 7674710 | Method of integrating metal-containing films into semiconductor devices | Shigeo Ashigaki, Tomoyuki Sakoda, Mikio Suzuki, Genji Nakamura, Gert Leusink | 2010-03-09 |
| 7482283 | Thin film forming method and thin film forming device | Yumiko Kawano | 2009-01-27 |
| 7456109 | Method for cleaning substrate processing chamber | Kazuhito Nakamura, Koumei Matsuzawa, Tsukasa Matsuda, Yumiko Kawano | 2008-11-25 |