SM

Seishi Murakami

TL Tokyo Electron Limited: 24 patents #199 of 5,567Top 4%
Fujitsu Limited: 2 patents #10,930 of 24,456Top 45%
MC Mitsubishi Gas Chemical Company: 2 patents #789 of 1,727Top 50%
Overall (All Time): #143,775 of 4,157,543Top 4%
27
Patents All Time

Issued Patents All Time

Showing 1–25 of 27 patents

Patent #TitleCo-InventorsDate
11965242 Raw material supply apparatus and raw material supply method Tsuneyuki Okabe, Eiichi KOMORI 2024-04-23
11348794 Semiconductor film forming method using hydrazine-based compound gas Hideo Nakamura, Yosuke Serizawa, Yoshikazu Ideno, Hiroaki Ashizawa, Takaya Shimizu 2022-05-31
10950417 Substrate processing apparatus and substrate loading mechanism Einosuke Tsuda, Takayuki Kamaishi 2021-03-16
10546753 Method of removing silicon oxide film Hideaki Yamasaki, Takamichi Kikuchi 2020-01-28
10221478 Film formation device Kensaku Narushima, Daisuke Toriya, Kentaro Asakura 2019-03-05
9984892 Oxide film removing method, oxide film removing apparatus, contact forming method, and contact forming system Takashi Kobayashi, Takashi Sakuma, Masahiko Tomita, Takamichi Kikuchi, Akitaka Shimizu +2 more 2018-05-29
9620370 Method of forming Ti film Takaya Shimizu, Satoshi Wakabayashi 2017-04-11
9349642 Method of forming contact layer Takaya Shimizu, Satoshi Wakabayashi 2016-05-24
8106335 Processing apparatus and heater unit Kunihiro Tada 2012-01-31
8021717 Film formation method, cleaning method and film formation apparatus Masaki Koizumi, Hiroaki Ashizawa, Masato Koizumi 2011-09-20
7351291 Semiconductor processing system 2008-04-01
6169032 CVD film formation method Tatsuo Hatano 2001-01-02
6153515 Method of forming multilayered film Tatsuo Hatano 2000-11-28
RE36925 Vacuum treatment apparatus and a method for manufacturing semiconductor device therein Takayuki Ohba, Toshiya Suzuki 2000-10-31
6126994 Liquid material supply apparatus and method Tatsuo Hatano 2000-10-03
5963834 Method for forming a CVD film Tatsuo Hatano, Keishi Akiba, Takaya Shimizu 1999-10-05
5880526 Barrier metal layer Tatsuo Hatano 1999-03-09
5733521 Process for producing a purified aqueous hydrogen peroxide solution Yoshitsugu Minamikawa, Masamichi Hattori 1998-03-31
5709757 Film forming and dry cleaning apparatus and method Tatsuo Hatano, Kunihiro Tada 1998-01-20
5704214 Apparatus for removing tramp materials and method therefor Yuichiro Fujikawa, Tatsuo Hatano 1998-01-06
5690743 Liquid material supply apparatus and method Tatsuo Hatano 1997-11-25
5595606 Shower head and film forming apparatus using the same Yuichiro Fujikawa, Tatsuo Hatano 1997-01-21
5522412 Vacuum treatment apparatus and a cleaning method therefor Takayuki Ohba, Toshiya Suzuki 1996-06-04
5462603 Semiconductor processing apparatus 1995-10-31
5456898 Method for enrichment and purification of aqueous hydrogen peroxide solution Shigeki Shimokawa, Yoshitsugu Minamikawa 1995-10-10