Issued Patents All Time
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12428727 | Cyclic film deposition using reductant gas | Ryota Yonezawa | 2025-09-30 |
| 12027344 | Film forming apparatus | Shinya Iwashita, Ayuta Suzuki, Takahiro SHINDO, Kazuki DEMPOH, Tatsuo Matsudo +2 more | 2024-07-02 |
| 11450512 | Plasma processing method | Shinya Iwashita, Naotaka Noro, Toshio Hasegawa, Tsuyoshi Moriya | 2022-09-20 |
| 10872764 | Film forming method | Shinya Iwashita, Naotaka Noro, Toshio Hasegawa, Tsuyoshi Moriya | 2020-12-22 |
| 10738374 | Method of performing a surface treatment on a mounting table, the mounting table and a plasma processing apparatus | Shinya Okabe, Hideaki Yamasaki, Junya Oka, Yuuji Kobayashi | 2020-08-11 |
| 10665431 | Processing method | Kazuyuki Tezuka, Kenichi Kato, Atsushi Sawachi, Takanori Mimura | 2020-05-26 |
| 10546753 | Method of removing silicon oxide film | Hideaki Yamasaki, Seishi Murakami | 2020-01-28 |
| 10361366 | Resistive random accress memory containing a conformal titanium aluminum carbide film and method of making | Takahiro Hakamata, Genji Nakamura, Sara Aoki, Toshio Hasegawa | 2019-07-23 |
| 9984892 | Oxide film removing method, oxide film removing apparatus, contact forming method, and contact forming system | Takashi Kobayashi, Seishi Murakami, Takashi Sakuma, Masahiko Tomita, Akitaka Shimizu +2 more | 2018-05-29 |
| 9659756 | Plasma etching apparatus and plasma cleaning method | — | 2017-05-23 |
| 7736942 | Substrate processing apparatus, substrate processing method and storage medium | Eiichi Nishimura | 2010-06-15 |