Issued Patents All Time
Showing 1–25 of 39 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12237173 | Substrate processing method, substrate processing apparatus and substrate processing system | Keiko Hada, Koichi Nagakura, Mitsuhiro Tachibana | 2025-02-25 |
| 12165848 | Substrate processing method, substrate processing apparatus, and method for producing nanowire or nanosheet transistor | Kenichi Oyama, Shohei Yamauchi, Kazuya Dobashi | 2024-12-10 |
| 11557486 | Etching method, damage layer removal method, and storage medium | — | 2023-01-17 |
| 11443952 | Etching method and etching device | Shuichiro Uda, Takeshi Saito, Taiki KATO | 2022-09-13 |
| 11328904 | Substrate processing apparatus | Shigeki Doba, Hiroyuki Ogawa, Hajime Naito, Tatsuo Matsudo | 2022-05-10 |
| 11024514 | Etching method and etching apparatus | Takuya Abe, Hidenori Miyoshi, Koichi Nagakura | 2021-06-01 |
| 10985029 | Substrate processing apparatus and substrate processing method | Hiroyuki Ogawa, Tomoya Okubo | 2021-04-20 |
| 10975468 | Method of cleaning plasma processing apparatus | Hiroki Kishi, Mitsuru Hashimoto, Keiichi Shimoda, Eiichi Nishimura | 2021-04-13 |
| 10923329 | Substrate processing apparatus and substrate processing method | Eiichi Nishimura, Fumiko Yamashita, Daisuke Urayama | 2021-02-16 |
| 10923358 | Substrate processing method | Muneyuki Imai | 2021-02-16 |
| 10903083 | Substrate processing method, substrate processing apparatus and substrate processing system | Keiko Hada, Koichi Nagakura, Mitsuhiro Tachibana | 2021-01-26 |
| 10734201 | Substrate processing apparatus | Shigeki Doba, Hiroyuki Ogawa, Hajime Naito, Tatsuo Matsudo | 2020-08-04 |
| 10541145 | Substrate processing apparatus and substrate processing method | Hiroyuki Ogawa, Tomoya Okubo | 2020-01-21 |
| 10254669 | Method for manufacturing toner for electrostatic image development | — | 2019-04-09 |
| 10053773 | Method of cleaning plasma processing apparatus | Hiroki Kishi, Mitsuru Hashimoto, Keiichi Shimoda, Eiichi Nishimura | 2018-08-21 |
| 9984892 | Oxide film removing method, oxide film removing apparatus, contact forming method, and contact forming system | Takashi Kobayashi, Seishi Murakami, Takashi Sakuma, Masahiko Tomita, Takamichi Kikuchi +2 more | 2018-05-29 |
| 9882124 | Etching method and substrate processing apparatus | Eiichi Nishimura, Fumiko Yamashita | 2018-01-30 |
| 9245776 | Plasma processing apparatus | Shinji Himori, Daisuke Hayashi | 2016-01-26 |
| 9214364 | Substrate cleaning apparatus and vacuum processing system | Kazuya Dobashi, Kensuke Inai, Kenta Yasuda, Yu Yoshino, Toshihiro Aida +1 more | 2015-12-15 |
| 9208997 | Method of etching copper layer and mask | Eiichi Nishimura, Masato Kushibiki, Takashi Sone, Fumiko Yamashita | 2015-12-08 |
| 9139901 | Plasma processing method | Tetsuya Ohishi | 2015-09-22 |
| 8642136 | Substrate processing method and substrate processing apparatus for performing a deposition process and calculating a termination time of the deposition process | Masato Kushibiki, Eiichi Nishimura | 2014-02-04 |
| 8383517 | Substrate processing method and substrate processing apparatus | Eiichi Nishimura, Chie Kato, Hiroyuki Takahashi | 2013-02-26 |
| 8298957 | Plasma etchimg method and plasma etching apparatus | Yosuke Sakao, Kensuke Kamiutanai | 2012-10-30 |
| RE43652 | Substrate processing control method and storage medium | Susumu Saito | 2012-09-11 |