Issued Patents All Time
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10923329 | Substrate processing apparatus and substrate processing method | Eiichi Nishimura, Akitaka Shimizu, Daisuke Urayama | 2021-02-16 |
| 9882124 | Etching method and substrate processing apparatus | Eiichi Nishimura, Akitaka Shimizu | 2018-01-30 |
| 9691643 | Etching apparatus | Eiichi Nishimura, Tadashi Kotsugi | 2017-06-27 |
| 9660182 | Plasma processing method and plasma processing apparatus | Takashi Sone, Daisuke Urayama, Masato Kushibiki, Nao Koizumi, Wataru Kume +1 more | 2017-05-23 |
| 9419211 | Etching method and substrate processing apparatus | Eiichi Nishimura, Masato Kushibiki, Nao Koizumi, Takashi Sone | 2016-08-16 |
| 9412618 | Pattern forming method | Shinya Morikita, Eiichi Nishimura | 2016-08-09 |
| 9245764 | Semiconductor device manufacturing method | Eiichi Nishimura, Tadashi Kotsugi, Kenji Adachi | 2016-01-26 |
| 9234083 | Method and apparatus for forming a periodic pattern using a self-assembled block copolymer | Eiichi Nishimura, Satoko Niitsuma | 2016-01-12 |
| 9208997 | Method of etching copper layer and mask | Eiichi Nishimura, Masato Kushibiki, Takashi Sone, Akitaka Shimizu | 2015-12-08 |
| 9177781 | Plasma processing method and manufacturing method of semiconductor device | Shigeru Tahara, Eiichi Nishimura, Hiroshi Tomita, Tokuhisa Ohiwa, Hisashi Okuchi +1 more | 2015-11-03 |
| 9165784 | Substrate processing method and storage medium | Eiichi Nishimura, Masato Kushibiki | 2015-10-20 |
| 9150969 | Method of etching metal layer | Eiichi Nishimura, Koyumi SASA | 2015-10-06 |
| 8877081 | Etching method and etching apparatus | Eiichi Nishimura, Tadashi Kotsugi | 2014-11-04 |
| 8778206 | Substrate processing method and storage medium | Eiichi Nishimura, Takashi Sone | 2014-07-15 |
| 8383521 | Substrate processing method | Eiichi Nishimura, Masato Kushibiki | 2013-02-26 |