Issued Patents All Time
Showing 1–25 of 33 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9177781 | Plasma processing method and manufacturing method of semiconductor device | Shigeru Tahara, Eiichi Nishimura, Fumiko Yamashita, Hiroshi Tomita, Hisashi Okuchi +1 more | 2015-11-03 |
| 9126229 | Deposit removal method | Shigeru Tahara, Eiichi Nishimura, Hiroshi Tomita, Hisashi Okuchi, Mitsuhiro Omura | 2015-09-08 |
| 8513134 | Semiconductor device producing method | Mitsuhiro Omura, Yumi Ohno, Takaya Matsushita | 2013-08-20 |
| 8487365 | Semiconductor device and method for manufacturing same | Toshiyuki Sasaki, Noriko SAKURAI, Katsunori Yahashi | 2013-07-16 |
| 8211783 | Method for manufacturing semiconductor device including a patterned SiOC film as a mask | Noriko SAKURAI, Katsunori Yahashi | 2012-07-03 |
| 7767055 | Capacitive coupling plasma processing apparatus | Shinji Himori, Noriaki Imai, Katsumi Horiguchi, Takaaki Nezu, Shoichiro Matsuyama +5 more | 2010-08-03 |
| 7767582 | Method of manufacturing semiconductor device | Nobuyasu Nishiyama, Kazuhiro Tomioka | 2010-08-03 |
| 7628931 | Processing method for conservation of processing gases | Masashi Saito, Yusuke Hirayama, Itsuko Sakai | 2009-12-08 |
| 7595885 | Process monitoring system, process monitoring method, and method for manufacturing semiconductor device | Takayuki Sakai, Masanobu Kibe | 2009-09-29 |
| 7349088 | Process monitoring system, process monitoring method, and method for manufacturing semiconductor device | Takayuki Sakai, Masanobu Kibe | 2008-03-25 |
| 7327455 | Process monitoring system, process monitoring method, and method for manufacturing semiconductor device | Takayuki Sakai, Masanobu Kibe | 2008-02-05 |
| 7285498 | Etching method | Kazuto Ogawa, Hisataka Hayashi, Koichiro Inazawa | 2007-10-23 |
| 7182879 | Plasma processing method | Itsuko Sakai | 2007-02-27 |
| 7045462 | Method for fabricating a pattern and method for manufacturing a semiconductor device | Takayuki Sakai, Masanobu Kibe | 2006-05-16 |
| 7022616 | High speed silicon etching method | Takanori Mimura, Kazuya Nagaseki, Itsuko Sakai | 2006-04-04 |
| 6911398 | Method of sequentially processing a plurality of lots each including semiconductor substrates | Masaki Narita, Katsuya Okumura | 2005-06-28 |
| 6887802 | Method of manufacturing semiconductor device and semiconductor device | Masaki Narita, Koichi Sato | 2005-05-03 |
| 6846750 | High precision pattern forming method of manufacturing a semiconductor device | Shoji Seta, Nobuo Hayasaka, Katsuya Okumura, Akihiro Kojima, Junko Ohuchi +3 more | 2005-01-25 |
| 6782907 | Gas recirculation flow control method and apparatus for use in vacuum system | Hiroyuki Kawasaki, Itsuko Sakai | 2004-08-31 |
| 6780278 | Plasma processing apparatus with reduced parasitic capacity and loss in RF power | Hisataka Hayashi, Kazuhiro Tomioka, Itsuko Sakai, Akihiro Kojima | 2004-08-24 |
| 6689699 | Method for manufacturing a semiconductor device using recirculation of a process gas | Itsuko Sakai, Takayuki Sakai | 2004-02-10 |
| 6576562 | Manufacturing method of semiconductor device using mask pattern having high etching resistance | Junko Ohuchi, Yasuhiko Sato, Eishi Shiobara, Hisataka Hayashi, Yasunobu Onishi | 2003-06-10 |
| 6433297 | Plasma processing method and plasma processing apparatus | Akihiro Kojima | 2002-08-13 |
| 6420271 | Method of forming a pattern | Yasuhiko Sato, Eishi Shiobara, Motoyuki Sato, Yasunobu Onishi, Hiroshi Tomita +2 more | 2002-07-16 |
| 6369423 | Semiconductor device with a thin gate stack having a plurality of insulating layers | Jeffrey P. Gambino, Katsuya Okumura, Jun-ichi Shiozawa | 2002-04-09 |