Issued Patents All Time
Showing 1–18 of 18 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12121963 | Metastable single-crystal rare earth magnet fine powder and method for producing same | Akihide Hosokawa, Kenta Takagi | 2024-10-22 |
| 11705313 | Inspection method and plasma processing apparatus | Shu Kusano | 2023-07-18 |
| 11183374 | Wastage determination method and plasma processing apparatus | Shu Kusano | 2021-11-23 |
| 10763089 | Wastage determination method and plasma processing apparatus | Shu Kusano | 2020-09-01 |
| 10290476 | Plasma processing method and plasma processing apparatus | Masaaki Miyagawa | 2019-05-14 |
| 10068778 | Plasma processing method and plasma processing apparatus | Masaaki Miyagawa | 2018-09-04 |
| 8975188 | Plasma etching method | Kazuhito Tohnoe | 2015-03-10 |
| 8975191 | Plasma etching method | Kazuhito Tohnoe, Yasuyoshi Ishiyama, Wataru Hashizume | 2015-03-10 |
| 8821683 | Substrate processing apparatus and method, and program and storage medium | Kazuya Nagaseki | 2014-09-02 |
| 8716144 | Method for manufacturing semiconductor device | Shuichiro Uda, Koji Maruyama | 2014-05-06 |
| 8664117 | Method for manufacturing semiconductor device using anisotropic etching | Katsuyuki Ono, Hideyuki Hatoh | 2014-03-04 |
| 8558134 | Plasma processing apparatus and plasma processing method | — | 2013-10-15 |
| 8114245 | Plasma etching device | Tadahiro Ohmi, Masaki Hirayama, Haruyuki Takano | 2012-02-14 |
| 7682978 | Plasma processing method and high-rate plasma etching apparatus | Koji Maruyama | 2010-03-23 |
| 7628931 | Processing method for conservation of processing gases | Masashi Saito, Itsuko Sakai, Tokuhisa Ohiwa | 2009-12-08 |
| 7405162 | Etching method and computer-readable storage medium | Koji Maruyama, Nozomi Hirai, Takanori Mimura | 2008-07-29 |
| 6585851 | Plasma etching device | Tadahiro Ohmi, Masaki Hirayama, Haruyuki Takano | 2003-07-01 |
| 6153068 | Parallel plate sputtering device with RF powered auxiliary electrodes and applied external magnetic field | Tadahiro Ohmi, Masaki Hirayama, Haruyuki Takano | 2000-11-28 |