Issued Patents All Time
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10672615 | Plasma processing apparatus and plasma processing method | Yosuke Sato, Akio Ui | 2020-06-02 |
| 10026622 | Method for manufacturing semiconductor device | Mitsuhiro Omura, Tsubasa Imamura | 2018-07-17 |
| 8580652 | Semiconductor device and manufacturing method thereof | Atsuko Kawasaki, Kenichiro Hagiwara, Ikuko Inoue, Kazutaka Akiyama, Mie Matsuo +6 more | 2013-11-12 |
| 8339615 | Edge detection method for transparent substrate by detecting non-light-emitting region of transparent substrate | Masayuki Dohi, Takayuki Sakai, Shunji Kikuchi, Takuto Inoue, Akihiro Hori +1 more | 2012-12-25 |
| 7767055 | Capacitive coupling plasma processing apparatus | Shinji Himori, Noriaki Imai, Katsumi Horiguchi, Takaaki Nezu, Shoichiro Matsuyama +5 more | 2010-08-03 |
| 7628931 | Processing method for conservation of processing gases | Masashi Saito, Yusuke Hirayama, Tokuhisa Ohiwa | 2009-12-08 |
| 7368876 | Plasma processing apparatus | Toshihiro Hayami, Etsuji Ito | 2008-05-06 |
| 7186315 | Plasma treatment apparatus | Shinji Himori | 2007-03-06 |
| 7182879 | Plasma processing method | Tokuhisa Ohiwa | 2007-02-27 |
| 7022616 | High speed silicon etching method | Takanori Mimura, Kazuya Nagaseki, Tokuhisa Ohiwa | 2006-04-04 |
| 6938638 | Gas circulating-processing apparatus | Hiroshi Kubota, Rempei Nakata, Naruhiko Kaji, Takashi Yoda | 2005-09-06 |
| 6782907 | Gas recirculation flow control method and apparatus for use in vacuum system | Hiroyuki Kawasaki, Tokuhisa Ohiwa | 2004-08-31 |
| 6780278 | Plasma processing apparatus with reduced parasitic capacity and loss in RF power | Hisataka Hayashi, Kazuhiro Tomioka, Tokuhisa Ohiwa, Akihiro Kojima | 2004-08-24 |
| 6689699 | Method for manufacturing a semiconductor device using recirculation of a process gas | Takayuki Sakai, Tokuhisa Ohiwa | 2004-02-10 |
| 6642149 | Plasma processing method | Tomoki Suemasa, Tsuyoshi Ono, Kouichiro Inazawa, Makoto Sekine, Yukimasa Yoshida | 2003-11-04 |
| 6038461 | Plastically deformable high temperature superconductive material and method of manufacturing formed body thereof | Yoshifumi Sakai | 2000-03-14 |
| 5717294 | Plasma process apparatus | Makoto Sekine, Keiji Horioka, Yukimasa Yoshida, Koichiro Inazawa, Masahiro Ogasawara +2 more | 1998-02-10 |
| 5539211 | Charged beam apparatus having cleaning function and method of cleaning charged beam apparatus | Kenji Ohtoshi, Yuichiro Yamazaki, Jun Takamatsu, Munehiro Ogasawara, Kazuyoshi Sugihara | 1996-07-23 |
| 5466942 | Charged beam irradiating apparatus having a cleaning means and a method of cleaning a charged beam irradiating apparatus | Nobuo Hayasaka, Haruo Okano | 1995-11-14 |
| 5312519 | Method of cleaning a charged beam apparatus | Nobuo Hayasaka, Haruo Okano | 1994-05-17 |