Issued Patents All Time
Showing 1–22 of 22 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12087556 | Plasma processing apparatus and plasma processing method | Yosuke Sato, Hisataka Hayashi | 2024-09-10 |
| 11497110 | Dielectric barrier discharge electrode and dielectric barrier discharge device | Yosuke Sato, Masato Akita, Shotaro OKA, Tomonao Takamatsu, Hiroyuki Yasui +1 more | 2022-11-08 |
| 10672615 | Plasma processing apparatus and plasma processing method | Yosuke Sato, Itsuko Sakai | 2020-06-02 |
| 10518270 | Dust collector and air conditioner | Yosuke Sato | 2019-12-31 |
| 10388544 | Substrate processing apparatus and substrate processing method | Hisataka Hayashi, Takeshi Kaminatsui, Shinji Himori, Norikazu Yamada, Takeshi Ohse +1 more | 2019-08-20 |
| 10381198 | Plasma processing apparatus and plasma processing method | Hisataka Hayashi, Kazuhiro Tomioka, Hiroshi Yamamoto, Tsubasa Imamura | 2019-08-13 |
| 10332906 | Dry etching method and method for manufacturing semiconductor device | Kaori Narumiya, Hisataka Hayashi, Keisuke Kikutani, Yosuke Sato | 2019-06-25 |
| 9934944 | Plasma induced flow electrode structure, plasma induced flow generation device, and method of manufacturing plasma induced flow electrode structure | Masato Akita, Yasushi Sanada | 2018-04-03 |
| 9799482 | Device manufacturing apparatus and manufacturing method of magnetic device using structure to pass ion beam | Yuichi Ohsawa, Junichi Ito, Chikayoshi Kamata, Megumi Yakabe, Saori Kashiwada | 2017-10-24 |
| 9583360 | Substrate processing apparatus and substrate processing method | Hisataka Hayashi, Keisuke Kikutani | 2017-02-28 |
| 9468698 | Gas processing apparatus | Yosuke Sato, Masato Akita, Yasushi Sanada | 2016-10-18 |
| 8821684 | Substrate plasma processing apparatus and plasma processing method | Naoki Tamaoki, Takashi Ichikawa, Hisataka Hayashi, Takeshi Kaminatsui, Shinji Himori +3 more | 2014-09-02 |
| 8821744 | Substrate processing method and substrate processing apparatus | Hisataka Hayashi | 2014-09-02 |
| 8545670 | Plasma processing apparatus and plasma processing method | Akihiro Kojima, Hisataka Hayashi | 2013-10-01 |
| 8548787 | Simulating a chemical reaction phenomenon in a semiconductor process | Naoki Tamaoki, Toshiro Takase, Takashi Ichikawa | 2013-10-01 |
| 8252193 | Plasma processing apparatus of substrate and plasma processing method thereof | Takashi Ichikawa, Naoki Tamaoki, Hisataka Hayashi, Akihiro Kojima | 2012-08-28 |
| 7851367 | Method for plasma processing a substrate | — | 2010-12-14 |
| 7247888 | Film forming ring and method of manufacturing semiconductor device | Hirotaka Ogihara, Yukio Nishiyama, Takashi O | 2007-07-24 |
| 6164295 | CVD apparatus with high throughput and cleaning method therefor | Naruhiko Kaji, Hideshi Miyajima, Nobuo Hayasaka | 2000-12-26 |
| 5976992 | Method of supplying excited oxygen | Isao Matsui, Yoshiaki Nakamura | 1999-11-02 |
| 5403630 | Vapor-phase growth method for forming S.sub.2 O.sub.2 films | Isao Matsui | 1995-04-04 |
| 5205870 | Vapor deposition apparatus | Yuusuke Sato, Keiichi Akagawa, Toshimitsu Ohmine | 1993-04-27 |