Issued Patents All Time
Showing 1–25 of 35 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12087556 | Plasma processing apparatus and plasma processing method | Yosuke Sato, Akio Ui | 2024-09-10 |
| 11651969 | Etching method, semiconductor manufacturing apparatus, and method of manufacturing semiconductor device | Chihiro Abe, Toshiyuki Sasaki, Mitsuhiro Omura, Tsubasa Imamura | 2023-05-16 |
| 10388544 | Substrate processing apparatus and substrate processing method | Akio Ui, Takeshi Kaminatsui, Shinji Himori, Norikazu Yamada, Takeshi Ohse +1 more | 2019-08-20 |
| 10381198 | Plasma processing apparatus and plasma processing method | Akio Ui, Kazuhiro Tomioka, Hiroshi Yamamoto, Tsubasa Imamura | 2019-08-13 |
| 10332906 | Dry etching method and method for manufacturing semiconductor device | Kaori Narumiya, Keisuke Kikutani, Akio Ui, Yosuke Sato | 2019-06-25 |
| 9583360 | Substrate processing apparatus and substrate processing method | Akio Ui, Keisuke Kikutani | 2017-02-28 |
| 9111875 | Pattern formation method | Hiroshi Yamamoto, Tsubasa Imamura, Mitsuhiro Omura | 2015-08-18 |
| 8840753 | Plasma etching unit | Masanobu Honda, Kazuya Nagaseki, Koichiro Inazawa, Shoichiro Matsuyama | 2014-09-23 |
| 8821744 | Substrate processing method and substrate processing apparatus | Akio Ui | 2014-09-02 |
| 8821684 | Substrate plasma processing apparatus and plasma processing method | Akio Ui, Naoki Tamaoki, Takashi Ichikawa, Takeshi Kaminatsui, Shinji Himori +3 more | 2014-09-02 |
| 8545670 | Plasma processing apparatus and plasma processing method | Akihiro Kojima, Akio Ui | 2013-10-01 |
| 8536061 | Semiconductor device manufacturing method | Yusuke Kasahara, Tsubasa Imamura | 2013-09-17 |
| 8524609 | Method of fabricating semiconductor device | Satoshi Inada, Mitsuhiro Omura | 2013-09-03 |
| 8252193 | Plasma processing apparatus of substrate and plasma processing method thereof | Akio Ui, Takashi Ichikawa, Naoki Tamaoki, Akihiro Kojima | 2012-08-28 |
| 8084360 | Method of manufacturing semiconductor device | Yusuke Kasahara | 2011-12-27 |
| 7749914 | Plasma etching method | Masanobu Honda, Kazuya Nagaseki | 2010-07-06 |
| 7727899 | Manufacturing method of semiconductor device and semiconductor storage device including fine contact holes | — | 2010-06-01 |
| 7658859 | Method of processing organic film using plasma etching and method of manufacturing semiconductor device | — | 2010-02-09 |
| 7625494 | Plasma etching method and plasma etching unit | Masanobu Honda, Kazuya Nagaseki, Koichiro Inazawa, Shoichiro Matsuyama | 2009-12-01 |
| 7419613 | Method and device for plasma-etching organic material film | Masanobu Honda, Shoichiro Matsuyama, Kazuya Nagaseki | 2008-09-02 |
| 7285498 | Etching method | Kazuto Ogawa, Tokuhisa Ohiwa, Koichiro Inazawa | 2007-10-23 |
| 6794286 | Process for fabricating a metal wiring and metal contact in a semicondutor device | Hisako Aoyama, Kyoichi Suguro, Hiromi Niiyama, Hitoshi Tamura, Tomonori Aoyama +2 more | 2004-09-21 |
| 6780278 | Plasma processing apparatus with reduced parasitic capacity and loss in RF power | Kazuhiro Tomioka, Itsuko Sakai, Tokuhisa Ohiwa, Akihiro Kojima | 2004-08-24 |
| 6576562 | Manufacturing method of semiconductor device using mask pattern having high etching resistance | Junko Ohuchi, Yasuhiko Sato, Eishi Shiobara, Tokuhisa Ohiwa, Yasunobu Onishi | 2003-06-10 |
| 6420271 | Method of forming a pattern | Yasuhiko Sato, Eishi Shiobara, Motoyuki Sato, Yasunobu Onishi, Hiroshi Tomita +2 more | 2002-07-16 |