Issued Patents All Time
Showing 1–24 of 24 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12394607 | Attracting method | — | 2025-08-19 |
| 12125679 | Plasma processing apparatus and processing method | Chishio Koshimizu, Gen TAMAMUSHI, Masahiro Inoue, Yuto KOSAKA | 2024-10-22 |
| 12046457 | Electrostatic chuck, focus ring, support base, plasma processing apparatus, and plasma processing method | Yasuharu Sasaki, Yohei Uchida | 2024-07-23 |
| 11830751 | Plasma processing apparatus and plasma processing method | Daiki Satoh, Yasuharu Sasaki, Takashi Nishijima, Jinyoung Park | 2023-11-28 |
| 11764038 | Plasma processing apparatus, electrostatic attraction method, and electrostatic attraction program | Naoki Tamaru, Yasuharu Sasaki | 2023-09-19 |
| 11728144 | Edge ring and substrate processing apparatus | — | 2023-08-15 |
| 11538668 | Mounting stage, substrate processing device, and edge ring | Yasuharu Sasaki, Kyo Tsuboi, Tomoya Kato | 2022-12-27 |
| 11004717 | Plasma processing apparatus and plasma processing method | Daiki Satoh, Yasuharu Sasaki, Takashi Nishijima, Jinyoung Park | 2021-05-11 |
| 10879050 | Plasma processing apparatus, electrostatic attraction method, and electrostatic attraction program | Naoki Tamaru, Yasuharu Sasaki | 2020-12-29 |
| 9390943 | Substrate processing apparatus | Kazuya Nagaseki, Etsuji Ito, Akihiro Yokota, Shinji Himori | 2016-07-12 |
| 9230824 | Method of manufacturing semiconductor device | Wataru TAKAYAMA, Susumu Nogami, Daisuke Tamura, Kyosuke Hayashi, Jun Kawanobe | 2016-01-05 |
| 8920598 | Electrode and plasma processing apparatus | Daisuke Hayashi, Koichi Murakami | 2014-12-30 |
| 8840753 | Plasma etching unit | Masanobu Honda, Kazuya Nagaseki, Koichiro Inazawa, Hisataka Hayashi | 2014-09-23 |
| 8741098 | Table for use in plasma processing system and plasma processing system | Akira Koshiishi, Shinji Himori | 2014-06-03 |
| 8636872 | Upper electrode and plasma processing apparatus | — | 2014-01-28 |
| 8293655 | Dry etching method | Masanobu Honda | 2012-10-23 |
| 8295026 | Electrostatic chuck and substrate processing apparatus having same | — | 2012-10-23 |
| 8284538 | Electrostatic chuck device | Shinji Himori, Atsushi Matsuura, Hiroshi Inazumachi, Mamoru Kosakai, Yukio Miura +1 more | 2012-10-09 |
| 7922862 | Plasma processing apparatus, electrode plate for plasma processing apparatus, and electrode plate manufacturing method | Katsuya Okumura, Shinji Himori, Kazuya Nagaseki, Hiroki Matsumaru, Toshiki Takahashi | 2011-04-12 |
| 7767055 | Capacitive coupling plasma processing apparatus | Shinji Himori, Noriaki Imai, Katsumi Horiguchi, Takaaki Nezu, Hiroki Matsumaru +5 more | 2010-08-03 |
| 7625494 | Plasma etching method and plasma etching unit | Masanobu Honda, Kazuya Nagaseki, Koichiro Inazawa, Hisataka Hayashi | 2009-12-01 |
| 7619870 | Electrostatic chuck | Shinji Himori, Atsushi Matsuura, Hiroshi Inazumachi, Mamoru Kosakai, Yukio Miura +1 more | 2009-11-17 |
| 7585386 | Plasma processing apparatus, electrode plate for plasma processing apparatus, and electrode plate manufacturing method | Katsuya Okumura, Shinji Himori, Kazuya Nagaseki, Hiroki Matsumaru, Toshiki Takahashi | 2009-09-08 |
| 7419613 | Method and device for plasma-etching organic material film | Masanobu Honda, Kazuya Nagaseki, Hisataka Hayashi | 2008-09-02 |