| 8840753 |
Plasma etching unit |
Masanobu Honda, Kazuya Nagaseki, Shoichiro Matsuyama, Hisataka Hayashi |
2014-09-23 |
| 8048325 |
Method and apparatus for multilayer photoresist dry development |
Vaidyanathan Balasubramaniam, Rie Inazawa, Rich Wise, Arpan Mahorawala, Siddhartha Panda |
2011-11-01 |
| 7700494 |
Low-pressure removal of photoresist and etch residue |
Vaidyanathan Balasubramaniam, Masaaki Hagihara, Eiichi Nishimura |
2010-04-20 |
| 7625494 |
Plasma etching method and plasma etching unit |
Masanobu Honda, Kazuya Nagaseki, Shoichiro Matsuyama, Hisataka Hayashi |
2009-12-01 |
| 7582220 |
Etching method |
Mitsuru Ishikawa, Masaaki Hagihara |
2009-09-01 |
| 7517468 |
Etching method |
Shuhei Ogawa |
2009-04-14 |
| 7344991 |
Method and apparatus for multilayer photoresist dry development |
Vaidyanathan Balasubramaniam, Rich Wise, Arpan Mahorowala, Siddhartha Panda |
2008-03-18 |
| 7344993 |
Low-pressure removal of photoresist and etch residue |
Vaidyanathan Balasubramaniam, Yasunori Hatamura, Masaaki Hagihara, Eiichi Nishimura |
2008-03-18 |
| 7326650 |
Method of etching dual damascene structure |
Yoshihide Kihara, Shin Okamoto, Tomoki Suemasa |
2008-02-05 |
| 7285498 |
Etching method |
Kazuto Ogawa, Hisataka Hayashi, Tokuhisa Ohiwa |
2007-10-23 |
| 7211197 |
Etching method and plasma processing method |
Masaaki Hagihara, Wakako Naito |
2007-05-01 |
| 7163887 |
Method for fabricating a semiconductor device |
Hiroshi Kudo |
2007-01-16 |
| 7125806 |
Etching method |
Akitoshi Harada |
2006-10-24 |
| 7119011 |
Semiconductor device and manufacturing method thereof |
Akitoshi Harada, Shin Okamoto |
2006-10-10 |
| 7030028 |
Etching method |
Takuya Mori, Noriyuki Kobayashi, Masahito Sugiura, Yoshihiro Hayashi, Keizo Kinoshita |
2006-04-18 |
| 6986851 |
Dry developing method |
Akinori Kitamura, Vaidya Balasubramaniam, Masaru Nishino |
2006-01-17 |
| 6780342 |
Method of etching and method of plasma treatment |
Masaaki Hagihara, Wakako Naito |
2004-08-24 |
| 6670276 |
Plasma processing method |
Tomoki Suemasa, Vaidyanathan Balasubramaniam |
2003-12-30 |
| 5772833 |
Plasma etching apparatus |
Yoshio Ishikawa, Takashi Asakawa, Masato Hiratsuka, Nobuyuki Okayama |
1998-06-30 |
| 5770098 |
Etching process |
Yoichi Araki, Sachiko Furuya, Masahiro Ogasawara, Chishio Koshimizu, Tiejun Song |
1998-06-23 |
| 5717294 |
Plasma process apparatus |
Itsuko Sakai, Makoto Sekine, Keiji Horioka, Yukimasa Yoshida, Masahiro Ogasawara +2 more |
1998-02-10 |
| 5705081 |
Etching method |
Shin Okamoto, Yoshifumi Tahara |
1998-01-06 |
| 5595627 |
Plasma etching method |
Shin Okamoto, Hisataka Hayashi, Takaya Matsushita |
1997-01-21 |
