Issued Patents All Time
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12341001 | Cleaning method and plasma processing apparatus | Wakako Ishida, Eundo Bae, Kazuya Kato, Inho Jang, Eisuke Numazawa | 2025-06-24 |
| 11430664 | Etching method and plasma processing apparatus | Wakako Ishida, Masaaki Kikuchi, Wataru Togashi | 2022-08-30 |
| 8382942 | Method and apparatus for reducing substrate backside deposition during processing | Kunihko Hinata | 2013-02-26 |
| 7344993 | Low-pressure removal of photoresist and etch residue | Vaidyanathan Balasubramaniam, Masaaki Hagihara, Eiichi Nishimura, Koichiro Inazawa | 2008-03-18 |
| 6849559 | Method for removing photoresist and etch residues | Vaidyanathan Balasubramaniam, Masaaki Hagiwara, Eiichi Nishimura, Kouichiro Inazawa | 2005-02-01 |