Issued Patents All Time
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7465673 | Method and apparatus for bilayer photoresist dry development | Yoshiki Igarashi, Kimihiro Higuchi, Vaidyanathan Balasubramaniam, Eiichi Nishimura, Ralph Kim +2 more | 2008-12-16 |
| 7169440 | Method for removing photoresist and etch residues | Vaidyanathan Balasubramaniam, Masaaki Hagiwara, Eiichi Nishimura | 2007-01-30 |
| 6849559 | Method for removing photoresist and etch residues | Vaidyanathan Balasubramaniam, Yasunori Hatamura, Masaaki Hagiwara, Eiichi Nishimura | 2005-02-01 |
| 6753263 | Etching method | Youbun Ito, Masahiro Yamada | 2004-06-22 |
| 6737350 | Method of manufacturing semiconductor device | Takashi Akahori, Kouji Senoo, Masaaki Hagiwara | 2004-05-18 |
| 6642149 | Plasma processing method | Tomoki Suemasa, Tsuyoshi Ono, Makoto Sekine, Itsuko Sakai, Yukimasa Yoshida | 2003-11-04 |
| 6602435 | Etching method | Masahiro Yamada, Youbun Ito | 2003-08-05 |
| 6488863 | Plasma etching method | Koichi Yatsuda, Tetsuya Nishiara, Shin Okamoto | 2002-12-03 |
| 6465359 | Etchant for use in a semiconductor processing method and system | Masahiro Yamada, Youbun Ito, Abron Toure, Kunihiko Hinata, Hiromi Sakima | 2002-10-15 |
| 6159862 | Semiconductor processing method and system using C.sub.5 F.sub.8 | Masahiro Yamada, Youbun Ito, Abron Toure, Kunihiko Hinata, Hiromi Sakima | 2000-12-12 |
| 6089181 | Plasma processing apparatus | Tomoki Suemasa, Tsuyoshi Ono | 2000-07-18 |
| 5721090 | Method of etching a substrate | Shin Okamoto, Sachiko Furuya, Maki Koizumi | 1998-02-24 |