Issued Patents All Time
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11557661 | Method for manufacturing semiconductor device | — | 2023-01-17 |
| 11495490 | Semiconductor device manufacturing method | Tatsuya Yamaguchi, Yannick Feurprier, Frederic Lazzarino, Jean-Francois de Marneffe, Khashayar Babaei Gavan | 2022-11-08 |
| 11171050 | Method for manufacturing a contact pad, method for manufacturing a semiconductor device using same, and semiconductor device | Takashi Hayakawa, Mitsuaki Iwashita, Takashi Tanaka | 2021-11-09 |
| 11120999 | Plasma etching method | Kaoru Maekawa, Nagisa Sato, Kumiko Ono, Shigeru Tahara, Jacques Faguet +4 more | 2021-09-14 |
| 11056349 | Method of fabricating semiconductor device, vacuum processing apparatus and substrate processing apparatus | Takashi Hayakawa, Hiroshi Okuno, Reiji Niino, Hiroyuki Hashimoto, Tatsuya Yamaguchi | 2021-07-06 |
| 11004684 | Forming method of hard mask | Mitsuaki Iwashita, Takeshi Nagao, Nobutaka Mizutani, Takashi Tanaka, Kazutoshi Iwai +1 more | 2021-05-11 |
| 10910259 | Semiconductor device manufacturing method | Tatsuya Yamaguchi, Yannick Feurprier, Frederic Lazzarino, Jean-Francois de Marneffe, Khashayar Babaei Gavan | 2021-02-02 |
| 10840359 | Method of forming FinFET source/drain contact | — | 2020-11-17 |
| 10593556 | Method of fabricating semiconductor device, vacuum processing apparatus and substrate processing apparatus | Takashi Hayakawa, Hiroshi Okuno, Reiji Niino, Hiroyuki Hashimoto, Tatsuya Yamaguchi | 2020-03-17 |
| 10325780 | Method of manufacturing semiconductor device | Takashi Hayakawa, Tatsuya Yamaguchi | 2019-06-18 |
| 10224202 | Forming method of hard mask, forming apparatus of hard mask and recording medium | Mitsuaki Iwashita, Takeshi Nagao, Nobutaka Mizutani, Takashi Tanaka, Kazutoshi Iwai +1 more | 2019-03-05 |
| 9879718 | Sliding bearing and method for manufacturing sliding bearing | Yoichiro Tsuboi, Atsushi Ueyama | 2018-01-30 |
| 9863466 | Sliding bearing | Yoichiro Tsuboi, Atsushi Ueyama | 2018-01-09 |
| 8685267 | Substrate processing method | Hiromasa Mochiki | 2014-04-01 |
| 8641916 | Plasma etching apparatus, plasma etching method and storage medium | Yoshinobu Ooya, Shin Okamoto, Hiromasa Mochiki | 2014-02-04 |
| 8198183 | Forming method of etching mask, control program and program storage medium | Eiichi Nishimura | 2012-06-12 |
| 8114781 | Substrate processing method and substrate processing apparatus | Eiichi Nishimura | 2012-02-14 |
| 7871908 | Method of manufacturing semiconductor device | Eiichi Nishimura | 2011-01-18 |
| 6488863 | Plasma etching method | Tetsuya Nishiara, Kouichiro Inazawa, Shin Okamoto | 2002-12-03 |
| 6156151 | Plasma processing apparatus | Mitsuaki Komino, Junichi Arami | 2000-12-05 |