Issued Patents All Time
Showing 1–25 of 38 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12249515 | Etching method and etching apparatus | Jacques Faguet, Kaoru Maekawa, Kumiko Ono, Nagisa Sato, Remi Dussart +3 more | 2025-03-11 |
| 12131914 | Selective etching with fluorine, oxygen and noble gas containing plasmas | Du Zhang, Hojin Kim, Kaoru Maekawa, Mingmei Wang, Jacques Faguet +4 more | 2024-10-29 |
| 12068171 | Method for etching oxide semiconductor film and plasma processing apparatus | Masahiro Yamazaki | 2024-08-20 |
| 11616194 | Etching method | Ken Ando, Hiroki Maehara, Jun Sato, Kiyoshi Maeda | 2023-03-28 |
| 11404283 | Etching method | Nobuaki Seki, Takahiko Kato | 2022-08-02 |
| 11361945 | Plasma processing apparatus, processing system, and method of etching porous film | — | 2022-06-14 |
| 11120999 | Plasma etching method | Koichi Yatsuda, Kaoru Maekawa, Nagisa Sato, Kumiko Ono, Jacques Faguet +4 more | 2021-09-14 |
| 10861678 | Plasma etching apparatus and method | Akira Koshiishi, Noriyuki Kobayashi, Shigeru Yoneda, Kenichi Hanawa, Masaru Sugimoto | 2020-12-08 |
| 10825688 | Method for etching copper layer | Daisuke Urayama, Kenji Matsumoto, Hidenori Miyoshi | 2020-11-03 |
| 10770308 | Etching method | Nobuaki Seki, Takahiko Kato | 2020-09-08 |
| 10626498 | Method of processing target object to be processed | Eiichi Nishimura | 2020-04-21 |
| 10319905 | Method and system for performing post-etch annealing of a workpiece | David Hurley, Doni Parnell, Toru Ishii | 2019-06-11 |
| 10236162 | Method of etching porous film | Eiichi Nishimura, Mikhail Baklanov, Liping Zhang, Jean-Francois de Marneffe | 2019-03-19 |
| 10229815 | Plasma etching apparatus and method | Akira Koshiishi, Noriyuki Kobayashi, Shigeru Yoneda, Kenichi Hanawa, Masaru Sugimoto | 2019-03-12 |
| 10074800 | Method for etching magnetic layer including isopropyl alcohol and carbon dioxide | Eiichi Nishimura | 2018-09-11 |
| 9859102 | Method of etching porous film | Eiichi Nishimura, Mikhail Baklanov, Liping Zhang, Jean-Francois de Marneffe | 2018-01-02 |
| 9786473 | Method of processing workpiece | — | 2017-10-10 |
| 9263288 | Etching method using block-copolymers | Boon Teik Chan | 2016-02-16 |
| 9177781 | Plasma processing method and manufacturing method of semiconductor device | Eiichi Nishimura, Fumiko Yamashita, Hiroshi Tomita, Tokuhisa Ohiwa, Hisashi Okuchi +1 more | 2015-11-03 |
| 9177816 | Deposit removal method | Eiichi Nishimura, Takanori Matsumoto | 2015-11-03 |
| 9126229 | Deposit removal method | Eiichi Nishimura, Hiroshi Tomita, Tokuhisa Ohiwa, Hisashi Okuchi, Mitsuhiro Omura | 2015-09-08 |
| 9023733 | Method for block-copolymer lithography | Boon Teik Chan | 2015-05-05 |
| 8986493 | Etching apparatus | Masaru Nishino | 2015-03-24 |
| 8852385 | Plasma etching apparatus and method | Akira Koshiishi, Noriyuki Kobayashi, Shigeru Yoneda, Kenichi Hanawa, Masaru Sugimoto | 2014-10-07 |
| 8614140 | Semiconductor device manufacturing apparatus | Ryuichi Asako, Gousuke Shiraishi | 2013-12-24 |