Issued Patents All Time
Showing 1–22 of 22 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12424447 | Method to selectively etch silicon nitride to silicon oxide using water crystallization | Yu-Hao Tsai, Du Zhang | 2025-09-23 |
| 12400863 | Method for etching for semiconductor fabrication | Yu-Hao Tsai, Du Zhang, Takatoshi Orui, Motoi Takahashi, Masahiko Yokoi +2 more | 2025-08-26 |
| 12308212 | In-situ adsorbate formation for plasma etch process | Du Zhang, Yu-Hao Tsai, Masahiko Yokoi, Yoshihide Kihara | 2025-05-20 |
| 12237172 | Etch process for oxide of alkaline earth metal | Du Zhang, Christophe Vallee | 2025-02-25 |
| 12131887 | Plasma processing system and method using radio frequency and microwave power | Yunho Kim, Yanxiang Shi | 2024-10-29 |
| 12131914 | Selective etching with fluorine, oxygen and noble gas containing plasmas | Du Zhang, Hojin Kim, Shigeru Tahara, Kaoru Maekawa, Jacques Faguet +4 more | 2024-10-29 |
| 11887815 | Plasma processing system and method using radio frequency (RF) and microwave power | Yunho Kim, Yanxiang Shi | 2024-01-30 |
| 11837471 | Methods of patterning small features | Katie Lutker-Lee, Jake Kaminsky, Yu-Hao Tsai, Angelique Raley | 2023-12-05 |
| 11804380 | High-throughput dry etching of films containing silicon-oxygen components or silicon-nitrogen components by proton-mediated catalyst formation | Du Zhang, Yu-Hao Tsai | 2023-10-31 |
| 11538692 | Cyclic plasma etching of carbon-containing materials | Yunho Kim, Du Zhang, Shihsheng Chang, Andrew Metz | 2022-12-27 |
| 11232954 | Sidewall protection layer formation for substrate processing | Yu-Hao Tsai | 2022-01-25 |
| 11189499 | Atomic layer etch (ALE) of tungsten or other metal layers | Yu-Hao Tsai, Du Zhang, Aelan Mosden, Matthew Flaugh | 2021-11-30 |
| 11158517 | Selective plasma etching of silicon oxide relative to silicon nitride by gas pulsing | Du Zhang, Yu-Hao Tsai | 2021-10-26 |
| 11152217 | Highly selective silicon oxide/silicon nitride etching by selective boron nitride or aluminum nitride deposition | Yu-Hao Tsai, Du Zhang | 2021-10-19 |
| 11024508 | Independent control of etching and passivation gas components for highly selective silicon oxide/silicon nitride etching | Du Zhang, Yu-Hao Tsai | 2021-06-01 |
| 10490404 | Method of in situ hard mask removal | Christopher Talone, Andrew Nolan, Alok Ranjan | 2019-11-26 |
| 10483127 | Methods for high precision plasma etching of substrates | Alok Ranjan, Peter L. G. Ventzek | 2019-11-19 |
| 10211065 | Methods for high precision plasma etching of substrates | Alok Ranjan, Peter L. G. Ventzek | 2019-02-19 |
| 9881807 | Method for atomic layer etching | Alok Ranjan, Sonam D. Sherpa | 2018-01-30 |
| 9768033 | Methods for high precision etching of substrates | Alok Ranjan, Peter L. G. Ventzek | 2017-09-19 |
| 9401263 | Feature etching using varying supply of power pulses | Xiang Hu, Gabriel Padron Wells, Jack Chao-Hsu Chang, Taejoon Han | 2016-07-26 |
| 8916472 | Interconnect formation using a sidewall mask layer | Xiang Hu, Liu Huang | 2014-12-23 |