Issued Patents All Time
Showing 1–25 of 37 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12189297 | Methods for extreme ultraviolet (EUV) resist patterning development | Yun Han, Alok Ranjan | 2025-01-07 |
| 11605539 | Defect correction on metal resists | Yun Han, Alok Ranjan | 2023-03-14 |
| 11527413 | Cyclic plasma etch process | Yun Han, Alok Ranjan | 2022-12-13 |
| 11183398 | Ruthenium hard mask process | Zhiying Chen, Alok Ranjan | 2021-11-23 |
| 11079682 | Methods for extreme ultraviolet (EUV) resist patterning development | Yun Han, Alok Ranjan | 2021-08-03 |
| 10483127 | Methods for high precision plasma etching of substrates | Mingmei Wang, Alok Ranjan | 2019-11-19 |
| 10211065 | Methods for high precision plasma etching of substrates | Mingmei Wang, Alok Ranjan | 2019-02-19 |
| 9947515 | Microwave surface-wave plasma device | Merritt Funk, Jianping Zhao, Lee Chen, Toshihiko Iwao, Toshihisa Nozawa +1 more | 2018-04-17 |
| 9947557 | Semiconductor processing system having multiple decoupled plasma sources | John Holland, Harmeet Singh, Richard A. Gottscho | 2018-04-17 |
| 9793095 | Microwave surface-wave plasma device | Merritt Funk, Jianping Zhao, Lee Chen, Toshihiko Iwao, Toshihisa Nozawa +1 more | 2017-10-17 |
| 9768033 | Methods for high precision etching of substrates | Alok Ranjan, Mingmei Wang | 2017-09-19 |
| 9728416 | Plasma tuning rods in microwave resonator plasma sources | Jianping Zhao, Lee Chen, Merritt Funk, Iwao Toshihiko | 2017-08-08 |
| 9530621 | Integrated induction coil and microwave antenna as an all-planar source | Lee Chen | 2016-12-27 |
| 9455133 | Hollow cathode device and method for using the device to control the uniformity of a plasma process | Kazuki Denpoh, Lin Xu, Lee Chen | 2016-09-27 |
| 9396900 | Radio frequency (RF) power coupling system utilizing multiple RF power coupling elements for control of plasma properties | Barton Lane, Lee Chen, Merritt Funk, Jianping Zhao, Radha Sundararajan | 2016-07-19 |
| 9396955 | Plasma tuning rods in microwave resonator processing systems | Jianping Zhao, Lee Chen, Merritt Funk, Iwao Toshihiko | 2016-07-19 |
| 9177756 | E-beam enhanced decoupled source for semiconductor processing | John Holland, Harmeet Singh, Jun Shinagawa, Akira Koshiishi | 2015-11-03 |
| 9111728 | E-beam enhanced decoupled source for semiconductor processing | John Holland, Harmeet Singh, Jun Shinagawa, Akira Koshiishi | 2015-08-18 |
| 9111727 | Plasma tuning rods in microwave resonator plasma sources | Jianping Zhao, Lee Chen, Merritt Funk, Toshihiko Iwao | 2015-08-18 |
| 8980046 | Semiconductor processing system with source for decoupled ion and radical control | Akira Koshiishi, Jun Shinagawa, John Holland | 2015-03-17 |
| 8900403 | Semiconductor processing system having multiple decoupled plasma sources | John Holland, Harmeet Singh, Richard A. Gottscho | 2014-12-02 |
| 8900402 | Semiconductor processing system having multiple decoupled plasma sources | John Holland, Harmeet Singh, Richard A. Gottscho | 2014-12-02 |
| 8808496 | Plasma tuning rods in microwave processing systems | Jianping Zhao, Lee Chen, Merritt Funk, Toshihiko Iwao | 2014-08-19 |
| 8409459 | Hollow cathode device and method for using the device to control the uniformity of a plasma process | Kazuki Denpoh, Lin Xu, Lee Chen | 2013-04-02 |
| 7772584 | Laterally grown nanotubes and method of formation | Marius Orlowski, Shahid Rauf | 2010-08-10 |