Issued Patents All Time
Showing 1–25 of 120 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12400865 | Pulsed capacitively coupled plasma processes | Peter Ventzek, Kensuke Taniguchi, Shinya Morikita | 2025-08-26 |
| 12394629 | Plasma processing methods using low frequency bias pulses | Peter Ventzek, Mitsunori Ohata | 2025-08-19 |
| 12300500 | Etching of polycrystalline semiconductors | Yun Han, Tomoyuki Oishi, Shuhei Ogawa, Ken Kobayashi, Peter Biolsi | 2025-05-13 |
| 12300468 | Method of uniformity control | Shyam Sridhar, Ya-Ming Chen, Peter Ventzek, Mitsunori Ohata | 2025-05-13 |
| 12300477 | Autonomous operation of plasma processing tool | Jun Shinagawa, Toshihiro KITAO, Chungjong Lee, Masaki Kitsunezuka | 2025-05-13 |
| 12288692 | Method of forming a FET structure by selective deposition of film on source/drain contact | Yun Han, Peter Ventzek, Andrew Metz, Hiroaki Niimi | 2025-04-29 |
| 12272520 | Process control enabled VDC sensor for plasma process | Merritt Funk, Peter Ventzek, Barton Lane, Justin Moses, Chelsea DuBose | 2025-04-08 |
| 12230475 | Systems and methods of control for plasma processing | Peter Ventzek, Mitsunori Ohata | 2025-02-18 |
| 12224160 | Topographic selective deposition | Shyam Sridhar, Peter Ventzek | 2025-02-11 |
| 12217935 | Plasma processing methods using multiphase multifrequency bias pulses | Ya-Ming Chen, Shyam Sridhar, Peter Ventzek | 2025-02-04 |
| 12189297 | Methods for extreme ultraviolet (EUV) resist patterning development | Yun Han, Peter L. G. Ventzek | 2025-01-07 |
| 12183583 | Remote source pulsing with advanced pulse control | Peter Ventzek, Mitsunori Ohata | 2024-12-31 |
| 12131888 | Gas cluster assisted plasma processing | Peter Ventzek | 2024-10-29 |
| 12057293 | Methods for real-time pulse measurement and pulse timing adjustment to control plasma process performance | Merritt Funk, Peter Ventzek | 2024-08-06 |
| 12014901 | Tailored electron energy distribution function by new plasma source: hybrid electron beam and RF plasma | Zhiying Chen, Peter Ventzek | 2024-06-18 |
| 12009430 | Method for gate stack formation and etching | Sergey Voronin, Christopher Catano, Sang Cheol Han, Shyam Sridhar, Yusuke Yoshida +1 more | 2024-06-11 |
| 11961735 | Cyclic plasma processing | Yun Han, Caitlin Philippi, Andrew Metz | 2024-04-16 |
| 11942307 | Plasma processing with radio frequency (RF) source and bias signal waveforms | Zhiying Chen, Barton Lane, Yun Han, Peter Ventzek | 2024-03-26 |
| 11915910 | Fast neutral generation for plasma processing | Peter Ventzek, Mitsunori Ohata | 2024-02-27 |
| 11869756 | Virtual metrology enhanced plasma process optimization method | Jun Shinagawa, Toshihiro KITAO, Atsushi Suzuki, Megan Wooley | 2024-01-09 |
| 11832373 | Plasma processing apparatus | Yohei Yamazawa, Takehisa Saito, Mayo UDA, Keigo Toyoda, Toshiki Nakajima | 2023-11-28 |
| 11817295 | Three-phase pulsing systems and methods for plasma processing | Peter Ventzek, Mitsunori Ohata | 2023-11-14 |
| 11734783 | System and method for detecting on-street parking violations | Prasant Kumar MISRA, Arunchandar Vasan, Krishna Kumar Sunil Komdam, Anand Sivasubramaniam | 2023-08-22 |
| 11699741 | Metal-containing liner process | Yusuke Yoshida, Sergey Voronin, Christopher Talone | 2023-07-11 |
| 11688586 | Method and apparatus for plasma processing | Peter Ventzek | 2023-06-27 |