Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
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Peter Biolsi — 11 Patents

IBM: 7 patents #14,688 of 70,183Top 25%
TLTokyo Electron Limited: 3 patents #2,069 of 5,567Top 40%
Albany, NY: #149 of 790 inventorsTop 20%
New York: #13,476 of 115,490 inventorsTop 15%
Overall (All Time): #435,149 of 4,157,543Top 15%
11 Patents All Time
Peter Biolsi has been granted 11 US patents while listed as an inventor at IBM. The first was granted in 2002 and the most recent in December 2025. Peter Biolsi ranks #435,149 of 4,157,543 US inventors in our database (top 10.5%). Patent records list Peter Biolsi in Albany, NY, US.

Patents per Year

Patents granted per year, 2002 to 2025Bar chart with a peak of 3 patents in 2025.peak 32002: 1 patents20022004: 1 patents20042006: 2 patents20062007: 1 patents20072008: 1 patents20082013: 2 patents20132025: 3 patents2025

Issued Patents All Time

Showing 1–11 of 11 patents

Patent #TitleCo-InventorsDateApprox Value ⓘ
12506112 Method for etching of metal Sergey Voronin, Qing Wang, Christopher NETZBAND, Gabriel Gibney, Sanghoon Han +2 more 2025-12-23
12300500 Etching of polycrystalline semiconductors Yun Han, Alok Ranjan, Tomoyuki Oishi, Shuhei Ogawa, Ken Kobayashi 2025-05-13
12266533 Sacrificial capping layer for contact etch Yun Han, Andrew Metz 2025-04-01
8614150 Methods of manufacturing semiconductor structures using RIE process Samuel S. Choi, Kevin J. Mackey 2013-12-24 $7,453,000
8532796 Contact processing using multi-input/multi-output (MIMO) models Daniel Prager, Merritt Funk, Ryukichi Shimizu 2013-09-10
7442650 Methods of manufacturing semiconductor structures using RIE process Samuel S. Choi, Kevin J. Mackey 2008-10-28 $6,235,000
7214608 Interlevel dielectric layer and metal layer sealing Matthew S. Angyal, Lawrence A. Clevenger, Habib Hichri, Bernd Kastenmeier, Michael Lane +3 more 2007-05-08 $8,960,000
7045464 Via reactive ion etching process Samuel S. Choi 2006-05-16 $5,914,000
7030031 Method for forming damascene structure utilizing planarizing material coupled with diffusion barrier material William C. Wille, Daniel C. Edelstein, William J. Cote, John Fritche, Allan Upham 2006-04-18 $9,074,000
6677678 Damascene structure using a sacrificial conductive layer Gregory S. Jankowski, Laurie M. Krywanczyk, Anthony K. Stamper 2004-01-13 $10,539,000
6444557 Method of forming a damascene structure using a sacrificial conductive layer Gregory S. Jankowski, Laurie M. Krywanczyk, Anthony K. Stamper 2002-09-03 $9,688,000