WC

William J. Cote

IBM: 43 patents #2,123 of 70,183Top 4%
AM AMD: 2 patents #3,994 of 9,279Top 45%
KT Kabushiki Kaisha Toshiba: 2 patents #9,982 of 21,451Top 50%
SA Siemens Aktiengesellschaft: 1 patents #10,653 of 22,248Top 50%
Overall (All Time): #65,142 of 4,157,543Top 2%
45
Patents All Time

Issued Patents All Time

Showing 25 most recent of 45 patents

Patent #TitleCo-InventorsDate
11588958 Probe assembly for process vessels Chen Chen, Paul Ream 2023-02-21
9213060 Probe-able voltage contrast test structures Yi Feng, Oliver D. Patterson 2015-12-15
9103875 Probe-able voltage contrast test structures Yi Feng, Oliver D. Patterson 2015-08-11
9097760 Probe-able voltage contrast test structures Yi Feng, Oliver D. Patterson 2015-08-04
8928057 Uniform finFET gate height Johnathan E. Faltermeier, Babar A. Khan, Ravikumar Ramachandran, Theodorus E. Standaert, Xinhui Wang 2015-01-06
8748252 Replacement metal gate transistors using bi-layer hardmask Effendi Leobandung, Laertis Economikos, Young-Hee Kim, Dae-Gyu Park, Theodorus E. Standaert +3 more 2014-06-10
8481423 Methods to mitigate plasma damage in organosilicate dielectrics John C. Arnold, Griselda Bonilla, Geraud Jean-Michel Dubois, Daniel C. Edelstein, Alfred Grill +8 more 2013-07-09
8470706 Methods to mitigate plasma damage in organosilicate dielectrics John C. Arnold, Griselda Bonilla, Geraud Jean-Michel Dubois, Daniel C. Edelstein, Alfred Grill +8 more 2013-06-25
8350583 Probe-able voltage contrast test structures Yi Feng, Oliver D. Patterson 2013-01-08
8340800 Monitoring a process sector in a production facility Michael P. Guse, Mark E. Lagus, James Rice, Yunsheng Song 2012-12-25
8293634 Structures and methods for improving solder bump connections in semiconductor devices Felix P. Anderson, Daniel C. Edelstein, Thomas L. McDevitt, Anthony K. Stamper 2012-10-23
8288281 Method for reducing amine based contaminants Xiaomeng Chen, Anthony K. Stamper, Arthur C. Winslow 2012-10-16
8242544 Semiconductor structure having reduced amine-based contaminants Xiaomeng Chen, Anthony K. Stamper, Arthur C. Winslow 2012-08-14
7803708 Method for reducing amine based contaminants Xiaomeng Chen, Anthony K. Stamper, Arthur C. Winslow 2010-09-28
7732866 Grounding front-end-of-line structures on a SOI substrate Oliver D. Patterson 2010-06-08
7518190 Grounding front-end-of-line structures on a SOI substrate Oliver D. Patterson 2009-04-14
7480990 Method of making conductor contacts having enhanced reliability John A. Fitzsimmons, Nancy Anne Greco, Thomas Ivers, Steven Moskowitz 2009-01-27
7323382 Intralevel decoupling capacitor, method of manufacture and testing circuit of the same Kerry Bernstein, John A. Bracchitta, Tak H. Ning, Wilbur D. Pricer 2008-01-29
7195971 Method of manufacturing an intralevel decoupling capacitor Kerry Bernstein, John A. Bracchitta, Tak H. Ning, Wilbur D. Pricer 2007-03-27
7153776 Method for reducing amine based contaminants Xiaomeng Chen, Anthony K. Stamper, Arthur C. Winslow 2006-12-26
7030031 Method for forming damascene structure utilizing planarizing material coupled with diffusion barrier material William C. Wille, Daniel C. Edelstein, Peter Biolsi, John Fritche, Allan Upham 2006-04-18
6882015 Intralevel decoupling capacitor, method of manufacture and testing circuit of the same Kerry Bernstein, John A. Bracchitta, Tak H. Ning, Wilbur D. Pricer 2005-04-19
6812193 Slurry for mechanical polishing (CMP) of metals and use thereof Michael T. Brigham, Donald F. Canaperi, Michael A. Cobb, Kenneth M. Davis, Scott A. Estes +9 more 2004-11-02
6743268 Chemical-mechanical planarization of barriers or liners for copper metallurgy Daniel C. Edelstein, Naftali E. Lustig 2004-06-01
6677637 Intralevel decoupling capacitor, method of manufacture and testing circuit of the same Kerry Bernstein, John A. Bracchitta, Tak H. Ning, Wilbur D. Pricer 2004-01-13