| 7630915 |
Intellectual property management method and apparatus |
Patricia McGuiness Marmillion, Bernadette Ann Pierson, Henry Charles Rickers, Howard J. Walter, Jr. |
2009-12-08 |
| 7323382 |
Intralevel decoupling capacitor, method of manufacture and testing circuit of the same |
Kerry Bernstein, William J. Cote, Tak H. Ning, Wilbur D. Pricer |
2008-01-29 |
| 7195971 |
Method of manufacturing an intralevel decoupling capacitor |
Kerry Bernstein, William J. Cote, Tak H. Ning, Wilbur D. Pricer |
2007-03-27 |
| 7089192 |
Intellectual property management method and apparatus |
Patricia Marmillion, Bernadette Ann Pierson, Henry Charles Rickers, Howard J. Walter, Jr. |
2006-08-08 |
| 6882015 |
Intralevel decoupling capacitor, method of manufacture and testing circuit of the same |
Kerry Bernstein, William J. Cote, Tak H. Ning, Wilbur D. Pricer |
2005-04-19 |
| 6858889 |
Polysilicon capacitor having large capacitance and low resistance |
James W. Adkisson, Jed H. Rankin, Anthony K. Stamper |
2005-02-22 |
| 6677637 |
Intralevel decoupling capacitor, method of manufacture and testing circuit of the same |
Kerry Bernstein, William J. Cote, Tak H. Ning, Wilbur D. Pricer |
2004-01-13 |
| 6660596 |
Double planar gated SOI MOSFET structure |
James W. Adkisson, John J. Ellis-Monaghan, Jerome B. Lasky, Effendi Leobandung, Kirk D. Peterson +1 more |
2003-12-09 |
| 6483156 |
Double planar gated SOI MOSFET structure |
James W. Adkisson, John J. Ellis-Monaghan, Jerome B. Lasky, Effendi Leobandung, Kirk D. Peterson +1 more |
2002-11-19 |
| 6420746 |
Three device DRAM cell with integrated capacitor and local interconnect |
Randy W. Mann, Jeffrey H. Oppold |
2002-07-16 |
| 6394638 |
Trench isolation for active areas and first level conductors |
Edward W. Sengle, Mark D. Jaffe, Daniel N. Maynard, Mark A. Lavin, Eric J. White |
2002-05-28 |
| 6373095 |
NVRAM cell having increased coupling ratio between a control gate and floating gate without an increase in cell area |
James S. Nakos |
2002-04-16 |
| 6344381 |
Method for forming pillar CMOS |
Jack A. Mandelman, Stephen A. Parke, Matthew R. Wordeman |
2002-02-05 |
| 6339015 |
Method of fabricating a non-volatile semiconductor device |
James S. Nakos |
2002-01-15 |
| 6261895 |
Polysilicon capacitor having large capacitance and low resistance and process for forming the capacitor |
James W. Adkisson, Jed H. Rankin, Anthony K. Stamper |
2001-07-17 |
| 6255699 |
Pillar CMOS structure |
Jack A. Mandelman, Stephen A. Parke, Matthew R. Wordeman |
2001-07-03 |
| 6232633 |
NVRAM cell using sharp tip for tunnel erase |
James S. Nakos |
2001-05-15 |
| 6130469 |
Electrically alterable antifuse using FET |
Wilbur D. Pricer |
2000-10-10 |
| 6100123 |
Pillar CMOS structure |
Jack A. Mandelman, Stephen A. Parke, Matthew R. Wordeman |
2000-08-08 |
| 6063687 |
Formation of trench isolation for active areas and first level conductors |
Edward W. Sengle, Mark D. Jaffe, Daniel N. Maynard, Mark A. Lavin, Eric J. White |
2000-05-16 |
| 6060358 |
Damascene NVRAM cell and method of manufacture |
Jeffrey B. Johnson, Glen L. Miles |
2000-05-09 |
| 6020777 |
Electrically programmable anti-fuse circuit |
Wilbur D. Pricer |
2000-02-01 |
| 5949265 |
Soft latch circuit having sharp-cornered hysteresis characteristics |
Michel S. Michail, Wilbur D. Pricer |
1999-09-07 |
| 5734192 |
Trench isolation for active areas and first level conductors |
Edward W. Sengle, Mark D. Jaffe, Daniel N. Maynard, Mark A. Lavin, Eric J. White |
1998-03-31 |
| 5518945 |
Method of making a diffused lightly doped drain device with built in etch stop |
Gabriel Hartstein, Stephen A. Mongeon, Anthony C. Speranza |
1996-05-21 |