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Nano deposition and ablation for the repair and fabrication of integrated circuits |
Shawn A. Adderly, Jeffrey P. Gambino, Eric A. Joseph |
2020-03-31 |
| 9583401 |
Nano deposition and ablation for the repair and fabrication of integrated circuits |
Shawn A. Adderly, Jeffrey P. Gambino, Eric A. Joseph |
2017-02-28 |
| 9484301 |
Controlled metal extrusion opening in semiconductor structure and method of forming |
Max G. Levy, Gary L. Milo, Matthew D. Moon, Timothy D. Sullivan, David C. Thomas +1 more |
2016-11-01 |
| 9087839 |
Semiconductor structures with metal lines |
Shawn A. Adderly, Daniel A. Delibac, Zhong-Xiang He, Matthew D. Moon, Timothy D. Sullivan +2 more |
2015-07-21 |
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Controlled metal extrusion opening in semiconductor structure and method of forming |
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2015-06-16 |
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CMOS (complementary metal oxide semiconductor) technology |
— |
2010-04-13 |
| 7462528 |
CMOS (Complementary metal oxide semiconductor) technology with leakage current mitigation |
— |
2008-12-09 |
| 7271044 |
CMOS (complementary metal oxide semiconductor) technology |
— |
2007-09-18 |
| 6417070 |
Method for forming a liner in a trench |
Arne Ballantine, Jeffrey S. Brown, Jeffrey D. Gilbert, James J. Quinlivan, James A. Slinkman |
2002-07-09 |
| 6121064 |
STI fill for SOI which makes SOI inspectable |
Jerome B. Lasky, Bret Philips, Justin W. Wong, Mickey H. Yu |
2000-09-19 |
| 6028339 |
Dual work function CMOS device |
Robert O. Frenette, Dale P. Hallock, Stephen A. Mongeon, William R. Tonti |
2000-02-22 |
| 5985768 |
Method of forming a semiconductor |
Bradley P. Jones |
1999-11-16 |
| 5770490 |
Method for producing dual work function CMOS device |
Robert O. Frenette, Dale P. Hallock, Stephen A. Mongeon, William R. Tonti |
1998-06-23 |
| 5518945 |
Method of making a diffused lightly doped drain device with built in etch stop |
John A. Bracchitta, Gabriel Hartstein, Stephen A. Mongeon |
1996-05-21 |