Issued Patents All Time
Showing 1–25 of 25 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8634949 | Manufacturing management using tool operating data | Brian C. Barker, Edward P. Higgins, Richard L. Kleinhenz, Gary R. Moore, Mark L. Reath +1 more | 2014-01-21 |
| 8260034 | Multi-modal data analysis for defect identification | Lisa Amini, Brian C. Barker, Perry G. Hartswick, Deepak S. Turaga, Olivier Verscheure | 2012-09-04 |
| 8233494 | Hierarchical and incremental multivariate analysis for process control | Lisa Amini, Edward Sumner Begle, Brian D. Pfeifer, Deepak S. Turaga, Olivier Verscheure +1 more | 2012-07-31 |
| 8140301 | Method and system for causal modeling and outlier detection | Naoki Abe, David L. Jensen, Srujana Merugu | 2012-03-20 |
| 7864502 | In situ monitoring of wafer charge distribution in plasma processing | Kevin Boyd, James A Gallo, Edward P. Higgins, Mark L. Reath, Barbara L Shiffler | 2011-01-04 |
| 7835814 | Tool for reporting the status and drill-down of a control application in an automated manufacturing environment | Michael W. Mock, Gary R. Moore | 2010-11-16 |
| 7805639 | Tool to report the status and drill-down of an application in an automated manufacturing environment | Michael W. Mock, Gary R. Moore | 2010-09-28 |
| 7793162 | Method for reporting the status and drill-down of a control application in an automated manufacturing environment | Michael W. Mock, Gary R. Moore | 2010-09-07 |
| 7493236 | Method for reporting the status of a control application in an automated manufacturing environment | Michael W. Mock, Gary R. Moore | 2009-02-17 |
| 7115210 | Measurement to determine plasma leakage | Robert A. Calderoni, June Cline, Kellie L. Dutra, Ronald G. Meunier, Joseph P. Walko | 2006-10-03 |
| 6121064 | STI fill for SOI which makes SOI inspectable | Jerome B. Lasky, Bret Philips, Anthony C. Speranza, Mickey H. Yu | 2000-09-19 |
| 5788801 | Real time measurement of etch rate during a chemical etching process | Steven G. Barbee, Tony F. Heinz, Yiping Hsiao, Leping Li, Eugene H. Ratzlaff | 1998-08-04 |
| 5728222 | Apparatus for chemical vapor deposition of aluminum oxide | Steven G. Barbee, Richard A. Conti, Alexander Kostenko, Narayana V. Sarma, Donald L. Wilson +1 more | 1998-03-17 |
| 5665608 | Method of aluminum oxide low pressure chemical vapor deposition (LPCVD) system-fourier transform infrared (FTIR) source chemical control | Jonathan D. Chapple-Sokol, Richard A. Conti, James A. O'Neill, Narayana V. Sarma, Donald L. Wilson | 1997-09-09 |
| 5648113 | Aluminum oxide LPCVD system | Steven G. Barbee, Jonathan D. Chapple-Sokol, Richard A. Conti, Richard Hsiao, James A. O'Neill +3 more | 1997-07-15 |
| 5614247 | Apparatus for chemical vapor deposition of aluminum oxide | Steven G. Barbee, Richard A. Conti, Alexander Kostenko, Narayana V. Sarma, Donald L. Wilson +1 more | 1997-03-25 |
| 5582746 | Real time measurement of etch rate during a chemical etching process | Steven G. Barbee, Tony F. Heinz, Yiping Hsiao, Leping Li, Eugene H. Ratzlaff | 1996-12-10 |
| 5573624 | Chemical etch monitor for measuring film etching uniformity during a chemical etching process | Steven G. Barbee, Tony F. Heinz, Yiping Hsiao, Leping Li, Eugene H. Ratzlaff | 1996-11-12 |
| 5540777 | Aluminum oxide LPCVD system | Steven G. Barbee, Jonathan D. Chapple-Sokol, Richard A. Conti, Richard Hsiao, James A. O'Neill +3 more | 1996-07-30 |
| 5516399 | Contactless real-time in-situ monitoring of a chemical etching | Michael J. Balconi-Lamica, Steven G. Barbee, Tony F. Heinz, Yiping Hsiao, Leping Li +1 more | 1996-05-14 |
| 5501766 | Minimizing overetch during a chemical etching process | Steven G. Barbee, Tony F. Heinz, Yiping Hsiao, Leping Li, Eugene H. Ratzlaff | 1996-03-26 |
| 5500073 | Real time measurement of etch rate during a chemical etching process | Steven G. Barbee, Tony F. Heinz, Yiping Hsiao, Leping Li, Eugene H. Ratzlaff | 1996-03-19 |
| 5489361 | Measuring film etching uniformity during a chemical etching process | Steven G. Barbee, Tony F. Heinz, Yiping Hsiao, Leping Li, Eugene H. Ratzlaff | 1996-02-06 |
| 5431734 | Aluminum oxide low pressure chemical vapor deposition (LPCVD) system-fourier transform infrared (FTIR) source chemical control | Jonathan D. Chapple-Sokol, Richard A. Conti, James A. O'Neill, Narayana V. Sarma, Donald L. Wilson | 1995-07-11 |
| 5425810 | Removable gas injectors for use in chemical vapor deposition of aluminium oxide | Richard A. Conti, David E. Kotecki, Donald L. Wilson, Steven P. Zuhoski | 1995-06-20 |