Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
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Leping Li — 53 Patents

IBM: 48 patents #1,839 of 70,183Top 3%
STSeagate Technology: 5 patents #1,194 of 4,701Top 30%
Bloomington, MN: #16 of 1,157 inventorsTop 2%
Minnesota: #798 of 52,454 inventorsTop 2%
Overall (All Time): #48,528 of 4,157,543Top 2%
53 Patents All Time
Leping Li has been granted 53 US patents while listed as an inventor at IBM. The first was granted in 1993 and the most recent in October 2016. Leping Li ranks #48,528 of 4,157,543 US inventors in our database (top 1.2%). Patent records list Leping Li in Bloomington, MN, US.

Issued Patents All Time

Showing 1–25 of 53 patents

Patent #TitleCo-InventorsDateApprox Value ⓘ
9478237 Work piece contact pad with centering feature Jeffrey R. O'Konski, Saravuth Keo, Pramit P. Parikh 2016-10-25 $12,475,000
9352442 Lapping carrier Kim Sek Tan, Choong Kit Mah, Soo Chun Loh, Choon Yen Lim, Chin Chong Yew +1 more 2016-05-31 $8,175,000
9308622 Lapping head with a sensor device on the rotating lapping head Andrew S. Menz, John F. L. Schmidt, Stephen Mackin 2016-04-12 $6,087,000
9115980 Row bar thickness measurement device, system and methods Sarah R. Marotz, Kara L. Maytag 2015-08-25 $8,541,000
8767351 Ambient temperature ball bond Saravuth Keo, Kara L. Maytag, Pramit P. Parikh, Jeff O'Konski, Mark Allen Herendeen +6 more 2014-07-01 $17,445,000
6989683 Enhanced endpoint detection for wet etch process control Steven G. Barbee 2006-01-24 $7,705,000
6899784 Apparatus for detecting CMP endpoint in acidic slurries Steven G. Barbee, Scott R. Cline, James Albert Gilhooly, Walter Imfeld, Werner Moser +4 more 2005-05-31 $8,494,000
6878629 Method for detecting CMP endpoint in acidic slurries Steven G. Barbee, Scott R. Cline, James Albert Gilhooly, Xinhui Wang, Cong Wei 2005-04-12 $5,340,000
6843880 Enhanced endpoint detection for wet etch process control Steven G. Barbee 2005-01-18 $12,326,000
6835117 Endpoint detection in chemical-mechanical polishing of patterned wafers having a low pattern density Xinhui Wang, Yingru Gu, Hung-Chin Guthrie 2004-12-28 $11,084,000
6741913 Technique for noise reduction in a torque-based chemical-mechanical polishing endpoint detection system Xinhui Wang, Yingru Gu 2004-05-25 $11,301,000
6506341 Chemiluminescence detection apparatus James Albert Gilhooly, Clifford Owen Morgan, III, Cong Wei, Werner Moser, Matthias Kutter +4 more 2003-01-14 $20,025,000
6440263 Indirect endpoint detection by chemical reaction and chemiluminescence James Albert Gilhooly, Clifford Owen Morgan, III, William Joseph Surovic, Cong Wei 2002-08-27 $8,564,000
6419785 Endpoint detection by chemical reaction James Albert Gilhooly, Clifford Owen Morgan, III, Cong Wei, Chienfan Yu 2002-07-16 $9,944,000
6291351 Endpoint detection in chemical-mechanical polishing of cloisonne structures Steven G. Barbee, Eric James Lee, Francisco Martin, Cong Wei 2001-09-18 $29,045,000
6276987 Chemical mechanical polishing endpoint process control James Albert Gilhooly, Clifford Owen Morgan, III, Cong Wei 2001-08-21 $21,309,000
6261851 Optimization of CMP process by detecting of oxide/nitride interface using IR system James Albert Gilhooly, Clifford Owen Morgan, III, Cong Wei 2001-07-17 $23,321,000
6254453 Optimization of chemical mechanical process by detection of oxide/nitride interface using CLD system James Albert Gilhooly, Clifford Owen Morgan, III, Cong Wei 2001-07-03 $26,086,000
6251784 Real-time control of chemical-mechanical polishing processing by monitoring ionization current James Albert Gilhooly, Clifford Owen Morgan, III, Cong Wei 2001-06-26 $22,108,000
6228769 Endpoint detection by chemical reaction and photoionization James Albert Gilhooly, Clifford Owen Morgan, III, Cong Wei, Chienfan Yu 2001-05-08 $26,391,000
6228280 Endpoint detection by chemical reaction and reagent James Albert Gilhooly, Clifford Owen Morgan, III, Cong Wei 2001-05-08 $26,391,000
6213846 Real-time control of chemical-mechanical polishing processes using a shaft distortion measurement Xinhui Wang 2001-04-10 $37,384,000
6194230 Endpoint detection by chemical reaction and light scattering James Albert Gilhooly, Clifford Owen Morgan, III, Cong Wei 2001-02-27 $24,775,000
6180422 Endpoint detection by chemical reaction James Albert Gilhooly, Clifford Owen Morgan, III, Cong Wei, Chienfan Yu 2001-01-30 $13,187,000
6176765 Accumulator for slurry sampling James Albert Gilhooly, Robert B. Lipori, Clifford Owen Morgan, III, William Joseph Surovic, Cong Wei 2001-01-23 $22,404,000