Issued Patents All Time
Showing 25 most recent of 53 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9478237 | Work piece contact pad with centering feature | Jeffrey R. O'Konski, Saravuth Keo, Pramit P. Parikh | 2016-10-25 |
| 9352442 | Lapping carrier | Kim Sek Tan, Choong Kit Mah, Soo Chun Loh, Choon Yen Lim, Chin Chong Yew +1 more | 2016-05-31 |
| 9308622 | Lapping head with a sensor device on the rotating lapping head | Andrew S. Menz, John F. L. Schmidt, Stephen Mackin | 2016-04-12 |
| 9115980 | Row bar thickness measurement device, system and methods | Sarah R. Marotz, Kara L. Maytag | 2015-08-25 |
| 8767351 | Ambient temperature ball bond | Saravuth Keo, Kara L. Maytag, Pramit P. Parikh, Jeff O'Konski, Mark Allen Herendeen +6 more | 2014-07-01 |
| 6989683 | Enhanced endpoint detection for wet etch process control | Steven G. Barbee | 2006-01-24 |
| 6899784 | Apparatus for detecting CMP endpoint in acidic slurries | Steven G. Barbee, Scott R. Cline, James Albert Gilhooly, Walter Imfeld, Werner Moser +4 more | 2005-05-31 |
| 6878629 | Method for detecting CMP endpoint in acidic slurries | Steven G. Barbee, Scott R. Cline, James Albert Gilhooly, Xinhui Wang, Cong Wei | 2005-04-12 |
| 6843880 | Enhanced endpoint detection for wet etch process control | Steven G. Barbee | 2005-01-18 |
| 6835117 | Endpoint detection in chemical-mechanical polishing of patterned wafers having a low pattern density | Xinhui Wang, Yingru Gu, Hung-Chin Guthrie | 2004-12-28 |
| 6741913 | Technique for noise reduction in a torque-based chemical-mechanical polishing endpoint detection system | Xinhui Wang, Yingru Gu | 2004-05-25 |
| 6506341 | Chemiluminescence detection apparatus | James Albert Gilhooly, Clifford Owen Morgan, III, Cong Wei, Werner Moser, Matthias Kutter +4 more | 2003-01-14 |
| 6440263 | Indirect endpoint detection by chemical reaction and chemiluminescence | James Albert Gilhooly, Clifford Owen Morgan, III, William Joseph Surovic, Cong Wei | 2002-08-27 |
| 6419785 | Endpoint detection by chemical reaction | James Albert Gilhooly, Clifford Owen Morgan, III, Cong Wei, Chienfan Yu | 2002-07-16 |
| 6291351 | Endpoint detection in chemical-mechanical polishing of cloisonne structures | Steven G. Barbee, Eric James Lee, Francisco Martin, Cong Wei | 2001-09-18 |
| 6276987 | Chemical mechanical polishing endpoint process control | James Albert Gilhooly, Clifford Owen Morgan, III, Cong Wei | 2001-08-21 |
| 6261851 | Optimization of CMP process by detecting of oxide/nitride interface using IR system | James Albert Gilhooly, Clifford Owen Morgan, III, Cong Wei | 2001-07-17 |
| 6254453 | Optimization of chemical mechanical process by detection of oxide/nitride interface using CLD system | James Albert Gilhooly, Clifford Owen Morgan, III, Cong Wei | 2001-07-03 |
| 6251784 | Real-time control of chemical-mechanical polishing processing by monitoring ionization current | James Albert Gilhooly, Clifford Owen Morgan, III, Cong Wei | 2001-06-26 |
| 6228769 | Endpoint detection by chemical reaction and photoionization | James Albert Gilhooly, Clifford Owen Morgan, III, Cong Wei, Chienfan Yu | 2001-05-08 |
| 6228280 | Endpoint detection by chemical reaction and reagent | James Albert Gilhooly, Clifford Owen Morgan, III, Cong Wei | 2001-05-08 |
| 6213846 | Real-time control of chemical-mechanical polishing processes using a shaft distortion measurement | Xinhui Wang | 2001-04-10 |
| 6194230 | Endpoint detection by chemical reaction and light scattering | James Albert Gilhooly, Clifford Owen Morgan, III, Cong Wei | 2001-02-27 |
| 6180422 | Endpoint detection by chemical reaction | James Albert Gilhooly, Clifford Owen Morgan, III, Cong Wei, Chienfan Yu | 2001-01-30 |
| 6176765 | Accumulator for slurry sampling | James Albert Gilhooly, Robert B. Lipori, Clifford Owen Morgan, III, William Joseph Surovic, Cong Wei | 2001-01-23 |