Issued Patents All Time
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6506341 | Chemiluminescence detection apparatus | Leping Li, James Albert Gilhooly, Cong Wei, Werner Moser, Matthias Kutter +4 more | 2003-01-14 |
| 6440263 | Indirect endpoint detection by chemical reaction and chemiluminescence | Leping Li, James Albert Gilhooly, William Joseph Surovic, Cong Wei | 2002-08-27 |
| 6419785 | Endpoint detection by chemical reaction | Leping Li, James Albert Gilhooly, Cong Wei, Chienfan Yu | 2002-07-16 |
| 6276987 | Chemical mechanical polishing endpoint process control | Leping Li, James Albert Gilhooly, Cong Wei | 2001-08-21 |
| 6261851 | Optimization of CMP process by detecting of oxide/nitride interface using IR system | Leping Li, James Albert Gilhooly, Cong Wei | 2001-07-17 |
| 6254453 | Optimization of chemical mechanical process by detection of oxide/nitride interface using CLD system | Leping Li, James Albert Gilhooly, Cong Wei | 2001-07-03 |
| 6251784 | Real-time control of chemical-mechanical polishing processing by monitoring ionization current | Leping Li, James Albert Gilhooly, Cong Wei | 2001-06-26 |
| 6228280 | Endpoint detection by chemical reaction and reagent | Leping Li, James Albert Gilhooly, Cong Wei | 2001-05-08 |
| 6228769 | Endpoint detection by chemical reaction and photoionization | Leping Li, James Albert Gilhooly, Cong Wei, Chienfan Yu | 2001-05-08 |
| 6194230 | Endpoint detection by chemical reaction and light scattering | Leping Li, James Albert Gilhooly, Cong Wei | 2001-02-27 |
| 6180422 | Endpoint detection by chemical reaction | Leping Li, James Albert Gilhooly, Cong Wei, Chienfan Yu | 2001-01-30 |
| 6176765 | Accumulator for slurry sampling | Leping Li, James Albert Gilhooly, Robert B. Lipori, William Joseph Surovic, Cong Wei | 2001-01-23 |
| 6126848 | Indirect endpoint detection by chemical reaction and chemiluminescence | Leping Li, James Albert Gilhooly, William Joseph Surovic, Cong Wei | 2000-10-03 |
| 6114249 | Chemical mechanical polishing of multiple material substrates and slurry having improved selectivity | Donald F. Canaperi, Rangarajan Jagannathan, Mahadevaiyer Krishnan, Terrance M. Wright | 2000-09-05 |
| 6110832 | Method and apparatus for slurry polishing | Matthew J. Rutten, Erick G. Walton, Terrance M. Wright | 2000-08-29 |
| 6066564 | Indirect endpoint detection by chemical reaction | Leping Li, James Albert Gilhooly, Cong Wei, Chienfan Yu | 2000-05-23 |
| 6021679 | Probe for slurry gas sampling | Leping Li, James Albert Gilhooly, Cong Wei, Werner Moser, Matthias Kutter +4 more | 2000-02-08 |
| 5876266 | Polishing pad with controlled release of desired micro-encapsulated polishing agents | Matthew Miller, Matthew J. Rutten, Erick G. Walton, Terrance M. Wright | 1999-03-02 |
| 5877589 | Gas discharge devices including matrix materials with ionizable gas filled sealed cavities | Matthew J. Rutten, Erick G. Walton, Terrance M. Wright | 1999-03-02 |
| 5658185 | Chemical-mechanical polishing apparatus with slurry removal system and method | Dennis Arthur Schmidt, Philip Theodoseau | 1997-08-19 |