| 6899784 |
Apparatus for detecting CMP endpoint in acidic slurries |
Leping Li, Steven G. Barbee, Scott R. Cline, Walter Imfeld, Werner Moser +4 more |
2005-05-31 |
| 6878629 |
Method for detecting CMP endpoint in acidic slurries |
Leping Li, Steven G. Barbee, Scott R. Cline, Xinhui Wang, Cong Wei |
2005-04-12 |
| 6506341 |
Chemiluminescence detection apparatus |
Leping Li, Clifford Owen Morgan, III, Cong Wei, Werner Moser, Matthias Kutter +4 more |
2003-01-14 |
| 6440263 |
Indirect endpoint detection by chemical reaction and chemiluminescence |
Leping Li, Clifford Owen Morgan, III, William Joseph Surovic, Cong Wei |
2002-08-27 |
| 6419785 |
Endpoint detection by chemical reaction |
Leping Li, Clifford Owen Morgan, III, Cong Wei, Chienfan Yu |
2002-07-16 |
| 6276987 |
Chemical mechanical polishing endpoint process control |
Leping Li, Clifford Owen Morgan, III, Cong Wei |
2001-08-21 |
| 6261851 |
Optimization of CMP process by detecting of oxide/nitride interface using IR system |
Leping Li, Clifford Owen Morgan, III, Cong Wei |
2001-07-17 |
| 6254453 |
Optimization of chemical mechanical process by detection of oxide/nitride interface using CLD system |
Leping Li, Clifford Owen Morgan, III, Cong Wei |
2001-07-03 |
| 6251784 |
Real-time control of chemical-mechanical polishing processing by monitoring ionization current |
Leping Li, Clifford Owen Morgan, III, Cong Wei |
2001-06-26 |
| 6228769 |
Endpoint detection by chemical reaction and photoionization |
Leping Li, Clifford Owen Morgan, III, Cong Wei, Chienfan Yu |
2001-05-08 |
| 6228280 |
Endpoint detection by chemical reaction and reagent |
Leping Li, Clifford Owen Morgan, III, Cong Wei |
2001-05-08 |
| 6194230 |
Endpoint detection by chemical reaction and light scattering |
Leping Li, Clifford Owen Morgan, III, Cong Wei |
2001-02-27 |
| 6180422 |
Endpoint detection by chemical reaction |
Leping Li, Clifford Owen Morgan, III, Cong Wei, Chienfan Yu |
2001-01-30 |
| 6176765 |
Accumulator for slurry sampling |
Leping Li, Robert B. Lipori, Clifford Owen Morgan, III, William Joseph Surovic, Cong Wei |
2001-01-23 |
| 6126848 |
Indirect endpoint detection by chemical reaction and chemiluminescence |
Leping Li, Clifford Owen Morgan, III, William Joseph Surovic, Cong Wei |
2000-10-03 |
| 6066564 |
Indirect endpoint detection by chemical reaction |
Leping Li, Clifford Owen Morgan, III, Cong Wei, Chienfan Yu |
2000-05-23 |
| 6021679 |
Probe for slurry gas sampling |
Leping Li, Clifford Owen Morgan, III, Cong Wei, Werner Moser, Matthias Kutter +4 more |
2000-02-08 |
| 5704987 |
Process for removing residue from a semiconductor wafer after chemical-mechanical polishing |
Cuc K. Huynh, Matthew J. Rutten, Susan L. Cohen, Douglas P. Nadeau, Robert A. Jurjevic |
1998-01-06 |
