| 7480888 |
Design structure for facilitating engineering changes in integrated circuits |
Clarence R. Ogilvie, Charles B. Winn, David W. Milton, Kenneth A. Lauricella, Nitin Sharma +4 more |
2009-01-20 |
| 6647579 |
Brush pressure control system for chemical and mechanical treatment of semiconductor surfaces |
Paul A. Manfredi |
2003-11-18 |
| 6432823 |
Off-concentric polishing system design |
Cuc K. Huynh, Paul A. Manfredi, Thomas J. Martin, Yutong Wu |
2002-08-13 |
| 6300246 |
Method for chemical mechanical polishing of semiconductor wafer |
Cuc K. Huynh, Paul A. Manfredi, Thomas J. Martin |
2001-10-09 |
| 6287178 |
Wafer carrier rinsing mechanism |
Cuc K. Huynh, Paul A. Manfredi, Thomas J. Martin, Joseph M. Weatherwax, Jr. |
2001-09-11 |
| 6273797 |
In-situ automated CMP wedge conditioner |
Kent R. Becker, Scott R. Cline, Paul A. Manfredi |
2001-08-14 |
| 6247368 |
CMP wet application wafer sensor |
Scott R. Cline, Willi O. Kalvaitis, Richard J. Lebel, Charles A. McKinney, Theodore G. van Kessel |
2001-06-19 |
| 5974868 |
Downstream monitor for CMP brush cleaners |
Donald M. DeCain, Cuc K. Huynh, Robert A. Jurjevic, Marc A. Taubenblatt |
1999-11-02 |
| 5913713 |
CMP polishing pad backside modifications for advantageous polishing results |
Roger W. Cheek, John Cronin, Matthew J. Rutten, Terrance M. Wright |
1999-06-22 |
| 5894622 |
Brush conditioner wing |
Paul A. Manfredi, Raymond G. Morris, Richard A. Bartley, Michael R. Amsden, deceased |
1999-04-20 |
| 5834642 |
Downstream monitor for CMP brush cleaners |
Donald M. DeCain, Cuc K. Huynh, Robert A. Jurjevic, Marc A. Taubenblatt |
1998-11-10 |
| 5778481 |
Silicon wafer cleaning and polishing pads |
Michael R. Amsden, deceased, Richard A. Bartley, Cuc K. Huynh, Paul A. Manfredi |
1998-07-14 |
| 5704987 |
Process for removing residue from a semiconductor wafer after chemical-mechanical polishing |
Cuc K. Huynh, Matthew J. Rutten, Susan L. Cohen, Robert A. Jurjevic, James Albert Gilhooly |
1998-01-06 |
