| 6647579 |
Brush pressure control system for chemical and mechanical treatment of semiconductor surfaces |
Douglas P. Nadeau |
2003-11-18 |
| 6432823 |
Off-concentric polishing system design |
Cuc K. Huynh, Thomas J. Martin, Douglas P. Nadeau, Yutong Wu |
2002-08-13 |
| 6350183 |
High pressure cleaning |
— |
2002-02-26 |
| 6300246 |
Method for chemical mechanical polishing of semiconductor wafer |
Cuc K. Huynh, Thomas J. Martin, Douglas P. Nadeau |
2001-10-09 |
| 6287178 |
Wafer carrier rinsing mechanism |
Cuc K. Huynh, Thomas J. Martin, Douglas P. Nadeau, Joseph M. Weatherwax, Jr. |
2001-09-11 |
| 6284092 |
CMP slurry atomization slurry dispense system |
— |
2001-09-04 |
| 6273797 |
In-situ automated CMP wedge conditioner |
Kent R. Becker, Scott R. Cline, Douglas P. Nadeau |
2001-08-14 |
| 6186873 |
Wafer edge cleaning |
Kent R. Becker, Stuart D. Cheney, Scott R. Cline, Eric J. White |
2001-02-13 |
| 5894622 |
Brush conditioner wing |
Douglas P. Nadeau, Raymond G. Morris, Richard A. Bartley, Michael R. Amsden, deceased |
1999-04-20 |
| 5785585 |
Polish pad conditioner with radial compensation |
Richard A. Bartley, Raymond G. Morris, Timothy Scott Chamberlin |
1998-07-28 |
| 5778481 |
Silicon wafer cleaning and polishing pads |
Michael R. Amsden, deceased, Richard A. Bartley, Cuc K. Huynh, Douglas P. Nadeau |
1998-07-14 |
| 5745945 |
Brush conditioner for a semiconductor cleaning brush |
Raymond G. Morris |
1998-05-05 |
