SB

Steven G. Barbee

IBM: 47 patents #1,870 of 70,183Top 3%
Overall (All Time): #60,322 of 4,157,543Top 2%
47
Patents All Time

Issued Patents All Time

Showing 25 most recent of 47 patents

Patent #TitleCo-InventorsDate
12093838 Efficient execution of a decision tree Jing Xu, Si Er Han, Xue Ying Zhang, Ji Hui Yang 2024-09-17
11562400 Uplift modeling Jing Xu, Si Er Han, Xue Ying Zhang, Ji Hui Yang 2023-01-24
11443235 Identifying optimal weights to improve prediction accuracy in machine learning techniques Jing Xu, Si Er Han, Xue Ying Zhang, Ji Hui Yang 2022-09-13
9189543 Predicting service request breaches Yogesh P. Badhe, George E. Stark 2015-11-17
7953689 Combined feature creation to increase data mining signal in hybrid datasets 2011-05-31
7895168 Data mining using variable rankings and enhanced visualization methods Benjamin Chu, John W. Hopkins 2011-02-22
7502658 Methods of fabricating optimization involving process sequence analysis Jeong Woo Nam, Viorel Ontalus, Yuusheng Song 2009-03-10
6989683 Enhanced endpoint detection for wet etch process control Leping Li 2006-01-24
6899784 Apparatus for detecting CMP endpoint in acidic slurries Leping Li, Scott R. Cline, James Albert Gilhooly, Walter Imfeld, Werner Moser +4 more 2005-05-31
6878629 Method for detecting CMP endpoint in acidic slurries Leping Li, Scott R. Cline, James Albert Gilhooly, Xinhui Wang, Cong Wei 2005-04-12
6858532 Low defect pre-emitter and pre-base oxide etch for bipolar transistors and related tooling Wesley C. Natzle, David C. Ahlgren, Marc W. Cantell, Basanth Jagannathan, Louis D. Lanzerotti +2 more 2005-02-22
6843880 Enhanced endpoint detection for wet etch process control Leping Li 2005-01-18
6291351 Endpoint detection in chemical-mechanical polishing of cloisonne structures Leping Li, Eric James Lee, Francisco Martin, Cong Wei 2001-09-18
6072313 In-situ monitoring and control of conductive films by detecting changes in induced eddy currents Leping Li, Arnold Halperin, Tony F. Heinz 2000-06-06
5788801 Real time measurement of etch rate during a chemical etching process Tony F. Heinz, Yiping Hsiao, Leping Li, Eugene H. Ratzlaff, Justin W. Wong 1998-08-04
5770948 Rotary signal coupling for chemical mechanical polishing endpoint detection with a strasbaugh tool Leping Li, Arnold Halperin, Richard Ruggiero, William Joseph Surovie 1998-06-23
5731697 In-situ monitoring of the change in thickness of films Leping Li, Arnold Halperin, Tony F. Heinz 1998-03-24
5728222 Apparatus for chemical vapor deposition of aluminum oxide Richard A. Conti, Alexander Kostenko, Narayana V. Sarma, Donald L. Wilson, Justin W. Wong +1 more 1998-03-17
5663637 Rotary signal coupling for chemical mechanical polishing endpoint detection with a westech tool Leping Li, Gary R. Doyle, Arnold Halperin, Kevin L. Holland, Francis Walter Kazak +4 more 1997-09-02
5660672 In-situ monitoring of conductive films on semiconductor wafers Leping Li, Arnold Halperin, Tony F. Heinz 1997-08-26
5659492 Chemical mechanical polishing endpoint process control Leping Li, Arnold Halperin 1997-08-19
5648113 Aluminum oxide LPCVD system Jonathan D. Chapple-Sokol, Richard A. Conti, Richard Hsiao, James A. O'Neill, Narayana V. Sarma +3 more 1997-07-15
5644221 Endpoint detection for chemical mechanical polishing using frequency or amplitude mode Leping Li, Arnold Halperin 1997-07-01
5614247 Apparatus for chemical vapor deposition of aluminum oxide Richard A. Conti, Alexander Kostenko, Narayana V. Sarma, Donald L. Wilson, Justin W. Wong +1 more 1997-03-25
5582746 Real time measurement of etch rate during a chemical etching process Tony F. Heinz, Yiping Hsiao, Leping Li, Eugene H. Ratzlaff, Justin W. Wong 1996-12-10