Issued Patents All Time
Showing 26–47 of 47 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5573624 | Chemical etch monitor for measuring film etching uniformity during a chemical etching process | Tony F. Heinz, Yiping Hsiao, Leping Li, Eugene H. Ratzlaff, Justin W. Wong | 1996-11-12 |
| 5573623 | Apparatus for contactless real-time in-situ monitoring of a chemical etching process | Tony F. Heinz, Leping Li, Eugene H. Ratzlaff | 1996-11-12 |
| 5559428 | In-situ monitoring of the change in thickness of films | Leping Li, Arnold Halperin, Tony F. Heinz | 1996-09-24 |
| 5540777 | Aluminum oxide LPCVD system | Jonathan D. Chapple-Sokol, Richard A. Conti, Richard Hsiao, James A. O'Neill, Narayana V. Sarma +3 more | 1996-07-30 |
| 5516399 | Contactless real-time in-situ monitoring of a chemical etching | Michael J. Balconi-Lamica, Tony F. Heinz, Yiping Hsiao, Leping Li, Eugene H. Ratzlaff +1 more | 1996-05-14 |
| 5501766 | Minimizing overetch during a chemical etching process | Tony F. Heinz, Yiping Hsiao, Leping Li, Eugene H. Ratzlaff, Justin W. Wong | 1996-03-26 |
| 5500073 | Real time measurement of etch rate during a chemical etching process | Tony F. Heinz, Yiping Hsiao, Leping Li, Eugene H. Ratzlaff, Justin W. Wong | 1996-03-19 |
| 5489361 | Measuring film etching uniformity during a chemical etching process | Tony F. Heinz, Yiping Hsiao, Leping Li, Eugene H. Ratzlaff, Justin W. Wong | 1996-02-06 |
| 5480511 | Method for contactless real-time in-situ monitoring of a chemical etching process | Tony F. Heinz, Leping Li, Eugene H. Ratzlaff | 1996-01-02 |
| 5456788 | Method and apparatus for contactless real-time in-situ monitoring of a chemical etching process | Madhav Datta, Tony F. Heinz, Leping Li, Eugene H. Ratzlaff, Ravindra V. Shenoy | 1995-10-10 |
| 5451289 | Fixture for in-situ noncontact monitoring of wet chemical etching with passive wafer restraint | Tony F. Heinz, Leping Li, Eugene H. Ratzlaff | 1995-09-19 |
| 5445705 | Method and apparatus for contactless real-time in-situ monitoring of a chemical etching process | Madhav Datta, Tony F. Heinz, Leping Li, Eugene H. Ratzlaff, Ravindra V. Shenoy | 1995-08-29 |
| 5392124 | Method and apparatus for real-time, in-situ endpoint detection and closed loop etch process control | Tony F. Heinz, Ulrich Hofer, Leping Li, Victor J. Silvestri | 1995-02-21 |
| 5386121 | In situ, non-destructive CVD surface monitor | Tony F. Heinz, Leping Li, Victor J. Silvestri | 1995-01-31 |
| 5381234 | Method and apparatus for real-time film surface detection for large area wafers | Tony F. Heinz, Richard J. Lebel, Leping Li, Victor J. Silvestri | 1995-01-10 |
| 5338390 | Contactless real-time in-situ monitoring of a chemical etching process | Tony F. Heinz, Leping Li, Eugene H. Ratzlaff | 1994-08-16 |
| 5220405 | Interferometer for in situ measurement of thin film thickness changes | Leping Li, Victor J. Silvestri | 1993-06-15 |
| 5134963 | LPCVD reactor for high efficiency, high uniformity deposition | Jonathan D. Chapple-Sokol, Richard A. Conti, David E. Kotecki | 1992-08-04 |
| 4781970 | Strengthening a ceramic by post sinter coating with a compressive surface layer | Hung-Chang W. Huang, Donald J. Hunt, Jungihl Kim, Jae Man Park, Charles H. Perry +1 more | 1988-11-01 |
| 4717596 | Method for vacuum vapor deposition with improved mass flow control | Gregory P. Devine, William J. Patrick, Gerard Seeley | 1988-01-05 |
| 4640221 | Vacuum deposition system with improved mass flow control | Gregory P. Devine, William J. Patrick, Gerard Seeley | 1987-02-03 |
| 4400715 | Thin film semiconductor device and method for manufacture | James M. Leas, James Lloyd, Arunachala Nagarajan | 1983-08-23 |