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Solid waste interceptor for a drain |
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2022-10-25 |
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In-situ oxidized NiO as electrode surface for high k MIM device |
Bryan C. Hendrix, Weimin Li |
2019-11-12 |
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Apparatus for treating waste water |
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2015-12-08 |
| 6518145 |
Methods to control the threshold voltage of a deep trench corner device |
Johann Alsmeier, George R. Goth, Max G. Levy, Victor R. Nastasi, Paul C. Parries |
2003-02-11 |
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Deep trench cell capacitor with inverting counter electrode |
Johann Alsmeier, Jack A. Mandelman, Christopher C. Parks, Paul C. Parries |
2001-07-24 |
| 5993059 |
Combined emissivity and radiance measurement for determination of temperature of radiant object |
Jyothi Singh |
1999-11-30 |
| 5793075 |
Deep trench cell capacitor with inverting counter electrode |
Johann Alsmeier, Jack A. Mandelman, Christopher C. Parks, Paul C. Parries |
1998-08-11 |
| 5770097 |
Control of etch selectivity |
Jyothi Singh |
1998-06-23 |
| 5738440 |
Combined emissivity and radiance measurement for the determination of the temperature of a radiant object |
Jyothi Singh |
1998-04-14 |
| 5683538 |
Control of etch selectivity |
Jyothi Singh |
1997-11-04 |
| 5665608 |
Method of aluminum oxide low pressure chemical vapor deposition (LPCVD) system-fourier transform infrared (FTIR) source chemical control |
Jonathan D. Chapple-Sokol, Richard A. Conti, Narayana V. Sarma, Donald L. Wilson, Justin W. Wong |
1997-09-09 |
| 5648113 |
Aluminum oxide LPCVD system |
Steven G. Barbee, Jonathan D. Chapple-Sokol, Richard A. Conti, Richard Hsiao, Narayana V. Sarma +3 more |
1997-07-15 |
| 5540777 |
Aluminum oxide LPCVD system |
Steven G. Barbee, Jonathan D. Chapple-Sokol, Richard A. Conti, Richard Hsiao, Narayana V. Sarma +3 more |
1996-07-30 |
| 5534066 |
Fluid delivery apparatus having an infrared feedline sensor |
Michael L. Passow, Tina J. Cotler, Jonathan D. Chapple-Sokol, Richard A. Conti, Jyothi Singh |
1996-07-09 |
| 5492718 |
Fluid delivery apparatus and method having an infrared feedline sensor |
Michael L. Passow, Tina J. Cotler, Jonathan D. Chapple-Sokol, Richard A. Conti, Jyothi Singh |
1996-02-20 |
| 5433258 |
Gettering of particles during plasma processing |
Michael Barnes, Dennis K. Coultas, John C. Forster, John H. Keller |
1995-07-18 |
| 5431734 |
Aluminum oxide low pressure chemical vapor deposition (LPCVD) system-fourier transform infrared (FTIR) source chemical control |
Jonathan D. Chapple-Sokol, Richard A. Conti, Narayana V. Sarma, Donald L. Wilson, Justin W. Wong |
1995-07-11 |
| 5332441 |
Apparatus for gettering of particles during plasma processing |
Michael Barnes, Dennis K. Coultas, John C. Forster, John H. Keller |
1994-07-26 |
| 5308414 |
Method and apparatus for optical emission end point detection in plasma etching processes |
Michael L. Passow, Jyothi Singh |
1994-05-03 |
| 5284549 |
Selective fluorocarbon-based RIE process utilizing a nitrogen additive |
Michael Barnes, Melanie M. Chow, John C. Forster, Michael Fury, Chang-Ching Kin +2 more |
1994-02-08 |
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Infrared thermographic method and apparatus for etch process monitoring and control |
George G. Gifford |
1993-04-06 |
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Fishing rod apparatus |
— |
1993-03-16 |
| 4746493 |
Waveguide reaction cell |
— |
1988-05-24 |
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Photochemical process using a waveguide reaction cell |
— |
1986-11-11 |
| 4620909 |
Method for isotope replenishment in an exchange liquid used in a laser induced isotope enrichment process |
Graham M. Keyser, David L. Mader |
1986-11-04 |
