Issued Patents All Time
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5770523 | Method for removal of photoresist residue after dry metal etch | Ming-Yeon Hung, Janet Yu, Weng-Liang Fang | 1998-06-23 |
| 5284549 | Selective fluorocarbon-based RIE process utilizing a nitrogen additive | Michael Barnes, Melanie M. Chow, John C. Forster, Michael Fury, Harris C. Jones +2 more | 1994-02-08 |
| 5268068 | High aspect ratio molybdenum composite mask method | Donald R. Cowell, Mark W. Jones, John J. Nahlik, John A. Trumpetto | 1993-12-07 |