Issued Patents All Time
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8229588 | Method and system for tuning advanced process control parameters | Andy Tsen, Chih-Wei Hsu, Ming-Yu Fan, Wang Jo Fei, Jong-I Mou | 2012-07-24 |
| 6069091 | In-situ sequential silicon containing hard mask layer/silicon layer plasma etch method | Fa-Yuan Chang | 2000-05-30 |
| 5770523 | Method for removal of photoresist residue after dry metal etch | Janet Yu, Weng-Liang Fang, Chang-Ching Kin | 1998-06-23 |