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Home › Aluminum oxide low pressure chemical vapor deposition (LPCVD) system-fourier transform infrared (FTIR) source chemical control

Aluminum oxide low pressure chemical vapor deposition (LPCVD) system-fourier transform infrared (FTIR) source chemical control

US Patent 5431734 · Granted Jul 11, 1995

Estimated economic value: $10,611,000 ⓘ

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