Issued Patents All Time
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6488778 | Apparatus and method for controlling wafer environment between thermal clean and thermal processing | Arne Ballantine, Peter A. Emmi, Walter Frey, Michael J. Gambero, Neena Garg +1 more | 2002-12-03 |
| 5728222 | Apparatus for chemical vapor deposition of aluminum oxide | Steven G. Barbee, Richard A. Conti, Alexander Kostenko, Narayana V. Sarma, Justin W. Wong +1 more | 1998-03-17 |
| 5665608 | Method of aluminum oxide low pressure chemical vapor deposition (LPCVD) system-fourier transform infrared (FTIR) source chemical control | Jonathan D. Chapple-Sokol, Richard A. Conti, James A. O'Neill, Narayana V. Sarma, Justin W. Wong | 1997-09-09 |
| 5648113 | Aluminum oxide LPCVD system | Steven G. Barbee, Jonathan D. Chapple-Sokol, Richard A. Conti, Richard Hsiao, James A. O'Neill +3 more | 1997-07-15 |
| 5614247 | Apparatus for chemical vapor deposition of aluminum oxide | Steven G. Barbee, Richard A. Conti, Alexander Kostenko, Narayana V. Sarma, Justin W. Wong +1 more | 1997-03-25 |
| 5540777 | Aluminum oxide LPCVD system | Steven G. Barbee, Jonathan D. Chapple-Sokol, Richard A. Conti, Richard Hsiao, James A. O'Neill +3 more | 1996-07-30 |
| 5431734 | Aluminum oxide low pressure chemical vapor deposition (LPCVD) system-fourier transform infrared (FTIR) source chemical control | Jonathan D. Chapple-Sokol, Richard A. Conti, James A. O'Neill, Narayana V. Sarma, Justin W. Wong | 1995-07-11 |
| 5425810 | Removable gas injectors for use in chemical vapor deposition of aluminium oxide | Richard A. Conti, David E. Kotecki, Justin W. Wong, Steven P. Zuhoski | 1995-06-20 |