| 7492008 |
Control of buried oxide in SIMOX |
Stephen Fox, Kenneth J. Giewont, Junedong Lee, Siegfried Maurer, Dan Moy +2 more |
2009-02-17 |
| 6967376 |
Divot reduction in SIMOX layers |
Stephen Fox, Kenneth J. Giewont, Junedong Lee, Devendra K. Sadana |
2005-11-22 |
| 6784072 |
Control of buried oxide in SIMOX |
Stephen Fox, Kenneth J. Giewont, Junedong Lee, Siegfried Maurer, Dan Moy +2 more |
2004-08-31 |
| 6531375 |
Method of forming a body contact using BOX modification |
Kenneth J. Giewont, Eric Adler, Michael Hargrove, Charles W. Koburger, III, Junedong Lee +2 more |
2003-03-11 |
| 6531411 |
Surface roughness improvement of SIMOX substrates by controlling orientation of angle of starting material |
Anthony G. Domenicucci, Kenneth J. Giewont, Richard J. Murphy, Gerd Pfeiffer, Gregory D. Pomarico +2 more |
2003-03-11 |
| 6495429 |
Controlling internal thermal oxidation and eliminating deep divots in SIMOX by chlorine-based annealing |
Michael E. Adamcek, Anthony G. Domenicucci, Stephen Fox, Kenneth J. Giewont, Thomas R. Kupiec +2 more |
2002-12-17 |
| 6488778 |
Apparatus and method for controlling wafer environment between thermal clean and thermal processing |
Arne Ballantine, Peter A. Emmi, Walter Frey, Michael J. Gambero, Byeongju Park +1 more |
2002-12-03 |
