Issued Patents All Time
Showing 1–25 of 38 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8490029 | Method of fabricating a device using low temperature anneal processes, a device and design structure | Terence L. Kane, Shreesh Narasimha, Karen A. Nummy, Viorel Ontalus, Yun-Yu Wang | 2013-07-16 |
| 8343825 | Reducing dislocation formation in semiconductor devices through targeted carbon implantation | Shreesh Narasimha, Karen A. Nummy, Viorel Ontalus, Yun-Yu Wang | 2013-01-01 |
| 8236709 | Method of fabricating a device using low temperature anneal processes, a device and design structure | Terence L. Kane, Shreesh Narasimha, Karen A. Nummy, Viorel Ontalus, Yun-Yu Wang | 2012-08-07 |
| 8227792 | Relaxed low-defect SGOI for strained SI CMOS applications | Paul D. Agnello, Stephen W. Bedell, Robert H. Dennard, Keith E. Fogel, Devendra K. Sadana | 2012-07-24 |
| 8021982 | Method of silicide formation by adding graded amount of impurity during metal deposition | Oh-Jung Kwon, O Sung Kwon, Jin Woo CHOI | 2011-09-20 |
| 8021971 | Structure and method to form a thermally stable silicide in narrow dimension gate stacks | Christian Lavoie, Ahmet S. Ozcan | 2011-09-20 |
| 7956417 | Method of reducing stacking faults through annealing | Yun-Yu Wang, Christopher D. Sheraw, Linda Black, Judson R. Holt, David M. Fried | 2011-06-07 |
| 7881093 | Programmable precision resistor and method of programming the same | Terence L. Kane, Michael P. Tenney, Yun-Yu Wang | 2011-02-01 |
| 7820501 | Decoder for a stationary switch machine | Yun-Yu Wang, Christopher D. Sheraw, Linda Black, Judson R. Holt, David M. Fried | 2010-10-26 |
| 7816664 | Defect reduction by oxidation of silicon | Stephen W. Bedell, Huajie Chen, Keith E. Fogel, Devendra K. Sadana | 2010-10-19 |
| 7705345 | High performance strained silicon FinFETs device and method for forming same | Stephen W. Bedell, Kevin K. Chan, Dureseti Chidambarrao, Silke H. Christianson, Jack O. Chu +4 more | 2010-04-27 |
| 7679141 | High-quality SGOI by annealing near the alloy melting point | Stephen W. Bedell, Huajie Chen, Keith E. Fogel, Richard J. Murphy, Devendra K. Sadana | 2010-03-16 |
| 7507988 | Semiconductor heterostructure including a substantially relaxed, low defect density SiGe layer | Stephen W. Bedell, Huajie Chen, Keith E. Fogel, Devendra K. Sadana | 2009-03-24 |
| 7473587 | High-quality SGOI by oxidation near the alloy melting temperature | Stephen W. Bedell, Keith E. Fogel, Devendra K. Sadana | 2009-01-06 |
| 7442993 | Ultra-thin, high quality strained silicon-on-insulator formed by elastic strain transfer | Stephen W. Bedell, Keith E. Fogel, Effendi Leobandung, Devendra K. Sadana | 2008-10-28 |
| 7358166 | Relaxed, low-defect SGOI for strained Si CMOS applications | Paul D. Agnello, Stephen W. Bedell, Robert H. Dennard, Keith E. Fogel, Devendra K. Sadana | 2008-04-15 |
| 7348253 | High-quality SGOI by annealing near the alloy melting point | Stephen W. Bedell, Huajie Chen, Keith E. Fogel, Richard J. Murphy, Devendra K. Sadana | 2008-03-25 |
| 7214935 | Transmission electron microscopy sample preparation method for electron holography | Thomas A. Bauer, Steven H. Boettcher, John G. Gaudiello, Leon J. Kimball, Jeffrey S. McMurray +1 more | 2007-05-08 |
| 7208414 | Method for enhanced uni-directional diffusion of metal and subsequent silicide formation | Bradley P. Jones, Christian Lavoie, Robert J. Purtell, Yun-Yu Wang, Kwong Hon Wong | 2007-04-24 |
| 7169226 | Defect reduction by oxidation of silicon | Stephen W. Bedell, Huajie Chen, Keith E. Fogel, Devendra K. Sadana | 2007-01-30 |
| 7102145 | System and method for improving spatial resolution of electron holography | Yun-Yu Wang | 2006-09-05 |
| 7049660 | High-quality SGOI by oxidation near the alloy melting temperature | Stephen W. Bedell, Keith E. Fogel, Devendra K. Sadana | 2006-05-23 |
| 7015469 | Electron holography method | Yun-Yu Wang, Masahiro Kawasaki, John Bruley, Michael A. Gribelyuk, John G. Gaudiello | 2006-03-21 |
| 6991998 | Ultra-thin, high quality strained silicon-on-insulator formed by elastic strain transfer | Stephen W. Bedell, Keith E. Fogel, Effendi Leobandung, Devendra K. Sadana | 2006-01-31 |
| 6946373 | Relaxed, low-defect SGOI for strained Si CMOS applications | Paul D. Agnello, Stephen W. Bedell, Robert H. Dennard, Keith E. Fogel, Devendra K. Sadana | 2005-09-20 |